Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7459745 | Methods of forming capacitors for semiconductor memory devices and resulting semiconductor memory devices | Shin-Hye Kim | 2008-12-02 |
| 7442607 | Method of manufacturing transistor having recessed channel | Min Su Kim, Hyeong-Deok Lee, Seung Jae Lee | 2008-10-28 |
| 7439150 | Method of manufacturing a semiconductor device | Shin-Hye Kim, Min Sang Kim | 2008-10-21 |
| 7335589 | Method of forming contact via through multiple layers of dielectric material | — | 2008-02-26 |
| 7288454 | Methods of forming capacitors for semiconductor memory devices and resulting semiconductor memory devices | Shin-Hye Kim | 2007-10-30 |
| 7125774 | Method of manufacturing transistor having recessed channel | Min Su Kim, Hyeon-Deok Lee, Seung Jae Lee | 2006-10-24 |
| 7049225 | Method for manufacturing vias between conductive patterns utilizing etching mask patterns formed on the conductive patterns | — | 2006-05-23 |
| 7033909 | Method of forming trench isolations | Hong-Rae Kim, Min Chul Kim | 2006-04-25 |
| 6982223 | Method of manufacturing a semiconductor device | Ju-Wan Kim, Shin-Hye Kim, Hyong-Soo Kim | 2006-01-03 |
| 6964922 | Methods for forming metal interconnections for semiconductor devices having multiple metal depositions | Jong-Myeong Lee, Hyeon-Deok Lee, In-Sun Park | 2005-11-15 |
| 6762126 | Method of forming an interlayer dielectric film | Young-Joo Cho, Eun-Kee Hong | 2004-07-13 |
| 6645879 | Method of forming a silicon oxide layer of a semiconductor device and method of forming a wiring having the same | Eun-Kee Hong, Ju-Seon Goo, Myeong-Cheol Kim, Hong-Gun Kim | 2003-11-11 |
| 6563162 | Semiconductor memory device for reducing parasitic bit line capacitance and method of fabricating the same | Myoung-Hee Han, Young-Hoon Park, Ju-Wan Kim | 2003-05-13 |
| 6372672 | Method of forming a silicon nitride layer in a semiconductor device | Do Hyung Kim, Byung Keun Hwang | 2002-04-16 |
| 5670400 | Method for making dual gate insulating film without edge-thinning | Joo-Hyung Lee, Jae Hyung Lee | 1997-09-23 |