JH

Jin-Hwa Heo

Samsung: 11 patents #12,136 of 75,807Top 20%
PF Postech Academy-Industry Foundation: 1 patents #529 of 1,477Top 40%
📍 Gwangju, KR: #101 of 1,647 inventorsTop 7%
Overall (All Time): #417,111 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
10053589 Surface treatment compositon for forming self-assembled coating capable of being easily coated, removed or recoated Dong Soo Hwang, Dong Yeop Oh 2018-08-21
8525275 Methods of forming non-volatile memory devices Chul-Sung Kim, Bon-Young Koo, Ki-Hyun Hwang, Chang-Hyun Lee 2013-09-03
8008154 Methods of forming impurity containing insulating films and flash memory devices including the same Young-Jin Noh, Bon-Young Koo, Si-Young Choi, Ki-Hyun Hwang, Chul-Sung Kim +1 more 2011-08-30
7535061 Fin-field effect transistors (Fin-FETs) having protection layers Deok-Hyung Lee, Si-Young Choi, Byeong-Chan Lee, In-Soo Jung 2009-05-19
7351661 Semiconductor device having trench isolation layer and a method of forming the same Soo-Jin Hong 2008-04-01
7160787 Structure of trench isolation and a method of forming the same Soo-Jin Hong 2007-01-09
7141456 Methods of fabricating Fin-field effect transistors (Fin-FETs) having protection layers Deok-Hyung Lee, Si-Young Choi, Byeong-Chan Lee, In-Soo Jung 2006-11-28
6756654 Structure of trench isolation and a method of forming the same Soo-Jin Hong 2004-06-29
6740955 Trench device isolation structure Soo-Jin Hong 2004-05-25
6683354 Semiconductor device having trench isolation layer and a method of forming the same Soo-Jin Hong 2004-01-27
6593207 Method of forming a trench device isolation structure with upper liner pattern Soo-Jin Hong 2003-07-15
6566229 Method of forming an insulating layer in a trench isolation type semiconductor device Soo-Jin Hong, Moon-han Park, Ju-Seon Goo, Hong-Gun Kim, Eun-Kee Hong 2003-05-20