Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10330535 | Pyrometer background elimination | — | 2019-06-25 |
| 9759615 | Pyrometer background elimination | — | 2017-09-12 |
| 9728471 | System for non radial temperature control for rotating substrates | Aaron Muir Hunter, Joseph M. Ranish | 2017-08-08 |
| 9640412 | Apparatus and method for enhancing the cool down of radiatively heated substrates | Joseph M. Ranish, Blake Koelmel | 2017-05-02 |
| 9564349 | Rapid thermal processing chamber with micro-positioning system | Khurshed Sorabji, Joseph M. Ranish, Aaron Muir Hunter, Blake Koelmel, Alexander Lerner +1 more | 2017-02-07 |
| 9431278 | Backside rapid thermal processing of patterned wafers | Sundar Ramamurthy, Aaron Muir Hunter | 2016-08-30 |
| 9390950 | Rapid thermal processing chamber with micro-positioning system | Khurshed Sorabji, Joseph M. Ranish, Aaron Muir Hunter, Blake Koelmel, Alexander Lerner +1 more | 2016-07-12 |
| 9245768 | Method of improving substrate uniformity during rapid thermal processing | — | 2016-01-26 |
| 9018110 | Apparatus and methods for microwave processing of semiconductor substrates | Michael W. Stowell, Majeed A. Foad, Ralf Hofmann, Stephen Moffatt | 2015-04-28 |
| 8939760 | Spike anneal residence time reduction in rapid thermal processing chambers | Jiping Li, Blake Koelmel, Aaron Muir Hunter | 2015-01-27 |
| 8900889 | Rapid thermal processing chamber with micro-positioning system | Khurshed Sorabji, Joseph M. Ranish, Aaron Muir Hunter, Blake Koelmel, Alexander Lerner +1 more | 2014-12-02 |
| 8865602 | Edge ring lip | Joseph M. Ranish, Blake Koelmel, Ilya Lavitsky | 2014-10-21 |
| 8724977 | System for non radial temperature control for rotating substrates | Aaron Muir Hunter, Joseph M. Ranish | 2014-05-13 |
| 8658945 | Backside rapid thermal processing of patterned wafers | Sundar Ramamurthy, Aaron Muir Hunter | 2014-02-25 |
| 8314371 | Rapid thermal processing chamber with micro-positioning system | Khurshed Sorabji, Joseph M. Ranish, Aaron Muir Hunter, Blake Koelmel, Alexander Lerner +1 more | 2012-11-20 |
| 8249436 | System for non radial temperature control for rotating substrates | Aaron Muir Hunter, Joseph M. Ranish | 2012-08-21 |
| 8111978 | Rapid thermal processing chamber with shower head | Khurshed Sorabji, Joseph M. Ranish, Aaron Muir Hunter, Alexander Lerner | 2012-02-07 |
| 8109669 | Temperature uniformity measurement during thermal processing | Jallepally Ravi, Balasubramanian Ramachandran, Aaron Muir Hunter, Ilias Iliopoulos | 2012-02-07 |
| 8104951 | Temperature uniformity measurements during rapid thermal processing | Andreas Hegedus, Nir Merry | 2012-01-31 |
| 7778533 | Semiconductor thermal process control | Balasubramanian Ramachandran, Leonid M. Tertitski, Patrick F. Stone | 2010-08-17 |
| 7667162 | Semiconductor thermal process control utilizing position oriented temperature generated thermal mask | Balasubramanian Ramachandran, Leonid M. Tertitski, Patrick F. Stone | 2010-02-23 |
| 7414224 | Backside rapid thermal processing of patterned wafers | Sundar Ramamurthy, Aaron Muir Hunter | 2008-08-19 |
| 7398693 | Adaptive control method for rapid thermal processing of a substrate | Joseph M. Ranish, Tarpan Dixit, Dean Jennings, Balasubramanian Ramachandran, Aaron Muir Hunter +2 more | 2008-07-15 |
| 7195934 | Method and system for deposition tuning in an epitaxial film growth apparatus | Ali Zojaji | 2007-03-27 |
| 6803546 | Thermally processing a substrate | Ryan Boas, Ajit Balakrishna, Benjamin Bierman, Brian Haas, Dean Jennings +2 more | 2004-10-12 |