Issued Patents All Time
Showing 51–75 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7977199 | Method for measuring dopant concentration during plasma ion implantation | Shijian Li | 2011-07-12 |
| 7968401 | Reducing photoresist layer degradation in plasma immersion ion implantation | Martin A. Hilkene, Kartik Santhanam, Yen B. Ta, Peter I. Porshnev | 2011-06-28 |
| 7968439 | Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces | Shijian Li, Kartik Ramaswamy, Hiroji Hanawa, Seon-Mee Cho, Biagio Gallo +1 more | 2011-06-28 |
| 7871828 | In-situ dose monitoring using optical emission spectroscopy | Seon-Mee Cho | 2011-01-18 |
| 7858503 | Ion implanted substrate having capping layer and method | Jose Ignacio del Agua Borniquel, Tze Wing Poon, Robert Schreutelkamp | 2010-12-28 |
| 7838399 | Plasma immersed ion implantation process using balanced etch-deposition process | Peter I. Porshnev | 2010-11-23 |
| 7811877 | Method of controlling metal silicide formation | Sundar Ramamurthy | 2010-10-12 |
| 7732269 | Method of ultra-shallow junction formation using Si film alloyed with carbon | Yihwan Kim, Yonah Cho, Zhiyuan Ye, Ali Zojaji, Errol Antonio C. Sanchez | 2010-06-08 |
| 7732309 | Plasma immersed ion implantation process | Shijian Li, Kartik Ramaswamy, Biagio Gallo, Dong-Hyung LEE | 2010-06-08 |
| 7723219 | Plasma immersion ion implantation process with reduced polysilicon gate loss and reduced particle deposition | Kartik Santhanam, Manoj Vallaikal, Peter I. Porshnev | 2010-05-25 |
| 7713757 | Method for measuring dopant concentration during plasma ion implantation | Shijian Li | 2010-05-11 |
| 7691755 | Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor | Shijian Li, Lily Pang, Seon-Mee Cho | 2010-04-06 |
| 7674723 | Plasma immersion ion implantation using an electrode with edge-effect suppression by a downwardly curving edge | Peter I. Porshnev | 2010-03-09 |
| 7659184 | Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking | Manoj Vellaikal, Kartik Santhanam, Yen B. Ta, Martin A. Hilkene, Matthew D. Scotney-Castle +2 more | 2010-02-09 |
| 7611976 | Gate electrode dopant activation method for semiconductor manufacturing | Yi Ma, Khaled Ahmed, Kevin Cunningham, Robert C. McIntosh, Abhilash J. Mayur +6 more | 2009-11-03 |
| 7531469 | Dosimetry using optical emission spectroscopy/residual gas analyzer in conjunction with ion current | Kartik Ramaswamy, Seon-Mee Cho, Tsutomu Tanaka | 2009-05-12 |
| 7482255 | Method of ion implantation to reduce transient enhanced diffusion | Houda Graoui, Amir Al-Bayati | 2009-01-27 |
| 7225047 | Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements | Amir Al-Bayati, Babak Adibi, Sasson Somekh | 2007-05-29 |
| 7078302 | Gate electrode dopant activation method for semiconductor manufacturing including a laser anneal | Yi Ma, Khaled Ahmed, Kevin Cunningham, Robert C. McIntosh, Abhilash J. Mayur +6 more | 2006-07-18 |
| 6872455 | Semiconductor material and method for enhancing solubility of a dopant therein | Babak Sadigh, Thomas Lenosky, Tomas Diaz de la Rubia, Martin D. Giles, Maria-Jose Caturla +4 more | 2005-03-29 |
| 6617228 | Semiconductor material and method for enhancing solubility of a dopant therein | Babak Sadigh, Thomas Lenosky, Tomas Rubia, Martin D. Giles, Maria-Jose Caturla +4 more | 2003-09-09 |
| 6583018 | Method of ion implantation | Yasuhiko Matsunaga | 2003-06-24 |
| 6501081 | Electron flood apparatus for neutralizing charge build up on a substrate during ion implantation | Yashuhiko Matsunaga | 2002-12-31 |
| 6498078 | Method for enhancing the solubility of boron and indium in silicon | Babak Sadigh, Thomas Lenosky, Tomas Diaz de la Rubia, Martin D. Giles, Maria-Jose Caturla +4 more | 2002-12-24 |
| 6200883 | Ion implantation method | Mitchell Taylor, Babak Adibi | 2001-03-13 |