Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12037701 | Multi-thermal CVD chambers with shared gas delivery and exhaust system | Zhiyuan Ye, Shu-Kwan LAU, Brian H. Burrows, Herman Diniz, Martin A. Hilkene +4 more | 2024-07-16 |
| 12015042 | Structure and material engineering methods for optoelectronic devices signal to noise ratio enhancement | Papo CHEN, Schubert S. Chu, Errol Antonio C. Sanchez, John Boland, Zhiyuan Ye +3 more | 2024-06-18 |
| 11393683 | Methods for high growth rate deposition for forming different cells on a wafer | David P. Bour, Gregg Higashi, Gang He | 2022-07-19 |
| 11075313 | Optoelectronic devices manufactured using different growth substrates | Nikhil Jain, Andrew J. RITENOUR, Ileana Rau, Claudio Canizares, Gang He +1 more | 2021-07-27 |
| 10873001 | Methods of manufacturing optoelectronic devices using different growth substrates | Nikhil Jain, Andrew J. RITENOUR, Ileana Rau, Claudio Canizares, Gang He +1 more | 2020-12-22 |
| 10811557 | Growth structure under a release layer for manufacturing of optoelectronic devices | Andrew J. RITENOUR, Ileana Rau, Claudio Canizares, Brendan M. Kayes, Gang He | 2020-10-20 |
| 10718051 | Methods for chemical vapor deposition (CVD) in a movable liner assembly | Gregg Higashi, Khurshed Sorabji | 2020-07-21 |
| 10066297 | Tiled showerhead for a semiconductor chemical vapor deposition reactor | Gregg Higashi, Alexander Lerner, Khurshed Sorabji, Andreas Hegedus | 2018-09-04 |
| 9982346 | Movable liner assembly for a deposition zone in a CVD reactor | Gregg Higashi, Khurshed Sorabji | 2018-05-29 |
| 9932670 | Method of decontamination of process chamber after in-situ chamber clean | Jie Su, Sandeep Nijhawan, Olga Kryliouk, Jacob Grayson, Sang Won Kang +2 more | 2018-04-03 |
| 9834860 | Method of high growth rate deposition for group III/V materials | David P. Bour, Gregg Higashi, Gang He | 2017-12-05 |
| 9644267 | Multi-gas straight channel showerhead | Brian H. Burrows, Alexander Tam, Ronald Stevens, Kenric Choi, James D. Felsch +4 more | 2017-05-09 |
| 9212422 | CVD reactor with gas flow virtual walls | Gregg Higashi, Alexander Lerner, Khurshed Sorabji | 2015-12-15 |
| 9175393 | Tiled showerhead for a semiconductor chemical vapor deposition reactor | Gregg Higashi, Khurshed Sorabji, Andreas Hegedus | 2015-11-03 |
| 8481118 | Multi-gas straight channel showerhead | Brian H. Burrows, Alexander Tam, Ronald Stevens, Kenric Choi, James D. Felsch +4 more | 2013-07-09 |
| 8105908 | Methods for forming a transistor and modulating channel stress | Sunderraj Thirupapuliyur, Faran Nouri | 2012-01-31 |
| 7976631 | Multi-gas straight channel showerhead | Brian H. Burrows, Alexander Tam, Ronald Stevens, Kenric Choi, James D. Felsch +4 more | 2011-07-12 |
| 7968413 | Methods for forming a transistor | Faran Nouri, Victor Moroz | 2011-06-28 |
| 7833869 | Methods for forming a transistor | Faran Nouri, Victor Moroz | 2010-11-16 |
| 7781016 | Method for measuring precursor amounts in bubbler sources | Ronald Stevens, Brendan McDougall, Jacob Smith, Garry K. Kwong, Sandeep Nijhawan | 2010-08-24 |
| 7674352 | System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatus | David P. Bour, Sandeep Nijhawan, Ronald Stevens, Jacob Smith, Alexander Tam +5 more | 2010-03-09 |
| 7651948 | Pre-cleaning of substrates in epitaxy chambers | Yihwan Kim, Jean R. Vatus, Arkadii V. Samoilov, Ali Zojaji | 2010-01-26 |
| 7585769 | Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPE | David P. Bour, Jacob Smith, Sandeep Nijhawan, David Eaglesham | 2009-09-08 |
| 7575982 | Stacked-substrate processes for production of nitride semiconductor structures | David P. Bour, Sandeep Nijhawan, Jacob Smith, David Eaglesham | 2009-08-18 |
| 7560364 | Dislocation-specific lateral epitaxial overgrowth to reduce dislocation density of nitride films | David P. Bour, Sandeep Nijhawan, Jacob Smith | 2009-07-14 |