Issued Patents All Time
Showing 51–75 of 252 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8992723 | RF bus and RF return bus for plasma chamber electrode | Carl A. Sorensen, Jozef Kudela, Robin L. Tiner, Suhail Anwar | 2015-03-31 |
| 8961756 | Ganged scanning of multiple magnetrons, especially two level folded magnetrons | Makoto Inagawa, Hien Minh Le, Akihiro Hosokawa, Bradley O. Stimson | 2015-02-24 |
| 8906813 | SiOx process chemistry development using microwave plasma CVD | Tae Kyung Won, Seon-Mee Cho, Soo Young Choi, Beom Soo Park, Dong-Kil Yim +1 more | 2014-12-09 |
| 8883269 | Thin film deposition using microwave plasma | Tae Kyung Won, Helinda NOMINANDA, Seon-Mee Cho, Soo Young Choi, Beom Soo Park +2 more | 2014-11-11 |
| D717113 | Susceptor with heater | Gaku Furuta, Robin L. Tiner, Suhail Anwar, Soo Young Choi | 2014-11-11 |
| 8877553 | Floating slit valve for transfer chamber interface | Shinichi Kurita, Takayuki Matsumoto | 2014-11-04 |
| D716098 | Susceptor with heater | Gaku Furuta, Robin L. Tiner, Suhail Anwar, Soo Young Choi, Shinichi Kurita | 2014-10-28 |
| 8872428 | Plasma source with vertical gradient | Jozef Kudela, Tsutomu Tanaka, Suhail Anwar, Carl A. Sorensen | 2014-10-28 |
| 8853098 | Substrate support with gas introduction openings | Sam Kim, Soo Young Choi, Carl A. Sorensen, Robin L. Tiner, Beom Soo Park | 2014-10-07 |
| D713200 | Susceptor with heater | Gaku Furuta, Robin L. Tiner, Suhail Anwar, Soo Young Choi | 2014-09-16 |
| 8832915 | Apparatus and method for the connection of conduits | — | 2014-09-16 |
| 8795793 | Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition | Soo Young Choi, Robert I. Greene | 2014-08-05 |
| 8733279 | PECVD process chamber backing plate reinforcement | Shinichi Kurita, Robin L. Tiner | 2014-05-27 |
| 8728586 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Jozef Kudela, Carl A. Sorensen | 2014-05-20 |
| 8691047 | Large area plasma processing chamber with at-electrode RF matching | Carl A. Sorensen, Jozef Kudela | 2014-04-08 |
| 8674844 | Detecting plasma chamber malfunction | Beom Soo Park, Hong Soon Kim, Soo Young Choi, James Hoffman, Suhail Anwar | 2014-03-18 |
| 8641014 | Gate valve | — | 2014-02-04 |
| 8574411 | Reactive sputtering chamber with gas distribution tubes | Yan Ye, Akihiro Hosokawa | 2013-11-05 |
| 8567756 | Slit valve door able to compensate for chamber deflection | Mehran Behdjat, Shinichi Kurita, Suhail Anwar, Makoto Inagawa | 2013-10-29 |
| 8438990 | Multi-electrode PECVD source | Jozef Kudela | 2013-05-14 |
| D680946 | Gas flow diffuser faceplate | Suhail Anwar, Soo Young Choi, Gaku Furuta, Shinichi Kurita, Carl Sorenson +1 more | 2013-04-30 |
| 8430961 | Source gas flow path control in PECVD system to control a by-product film deposition on inside chamber | Beom Soo Park, Young Jin Choi, Robin L. Tiner, Sam Kim, Soo Young Choi +1 more | 2013-04-30 |
| 8404502 | Water-barrier encapsulation method | Tae Kyung Won, Jose Manuel Dieguez Campo, Sanjay Yadav | 2013-03-26 |
| 8381677 | Prevention of film deposition on PECVD process chamber wall | Beom Soo Park, Robin L. Tiner, Soo Young Choi | 2013-02-26 |
| 8377209 | Linear plasma source for dynamic (moving substrate) plasma processing | — | 2013-02-19 |