Issued Patents All Time
Showing 51–75 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9095952 | Reflectivity measurements during polishing using a camera | Boguslaw A. Swedek | 2015-08-04 |
| 9073169 | Feedback control of polishing using optical detection of clearance | Kun Xu, Ingemar Carlsson, Feng Q. Liu, David Maxwell Gage, You Wang +5 more | 2015-07-07 |
| 9056383 | Path for probe of spectrographic metrology system | Jeffrey Drue David, Benjamin Cherian, Boguslaw A. Swedek, Thomas H. Osterheld, Jun Qian +4 more | 2015-06-16 |
| 8992286 | Weighted regression of thickness maps from spectral data | Benjamin Cherian, Jeffrey Drue David, Boguslaw A. Swedek, Jun Qian, Thomas H. Osterheld | 2015-03-31 |
| 8989890 | GST film thickness monitoring | Kun Xu, Feng Q. Liu, Boguslaw A. Swedek, Yuchun Wang, Wen-Chiang Tu +1 more | 2015-03-24 |
| 8977379 | Endpoint method using peak location of spectra contour plots versus time | Jeffrey Drue David, Harry Q. Lee, Boguslaw A. Swedek | 2015-03-10 |
| 8944884 | Fitting of optical model to measured spectrum | Jeffrey Drue David | 2015-02-03 |
| 8942842 | Varying optical coefficients to generate spectra for polishing control | Jeffrey Drue David, Xiaoyuan Hu | 2015-01-27 |
| 8932107 | Gathering spectra from multiple optical heads | Jeffrey Drue David, Boguslaw A. Swedek, Sivakumar Dhandapani | 2015-01-13 |
| 8892568 | Building a library of spectra for optical monitoring | Jeffrey Drue David, Xiaoyuan Hu | 2014-11-18 |
| 8874250 | Spectrographic monitoring of a substrate during processing using index values | Jeffrey Drue David, Harry Q. Lee, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2014-10-28 |
| 8815109 | Spectra based endpointing for chemical mechanical polishing | Boguslaw A. Swedek, Jeffrey Drue David | 2014-08-26 |
| 8758086 | Friction sensor for polishing system | Gabriel L. Miller, Manoocher Birang, Nils Johansson, Boguslaw A. Swedek | 2014-06-24 |
| 8755928 | Automatic selection of reference spectra library | Jimin Zhang, Harry Q. Lee, Zhihong Wang, Jeffrey Drue David, Boguslaw A. Swedek | 2014-06-17 |
| 8751033 | Adaptive tracking spectrum features for endpoint detection | Jeffrey Drue David, Boguslaw A. Swedek, Harry Q. Lee | 2014-06-10 |
| 8718810 | Semi-quantitative thickness determination | Boguslaw A. Swedek, Jeffrey Drue David, Harry Q. Lee | 2014-05-06 |
| 8679979 | Using optical metrology for within wafer feed forward process control | Jeffrey Drue David, Harry Q. Lee, Boguslaw A. Swedek, Zhize Zhu, Wen-Chiang Tu | 2014-03-25 |
| 8657646 | Endpoint detection using spectrum feature trajectories | Boguslaw A. Swedek | 2014-02-25 |
| 8591698 | Peak-based endpointing for chemical mechanical polishing | Boguslaw A. Swedek, David J. Lischka | 2013-11-26 |
| 8585790 | Treatment of polishing pad window | Boguslaw A. Swedek | 2013-11-19 |
| 8579675 | Methods of using optical metrology for feed back and feed forward process control | Jeffrey Drue David, Harry Q. Lee, Boguslaw A. Swedek, Zhize Zhu, Wen-Chiang Tu | 2013-11-12 |
| 8569174 | Using spectra to determine polishing endpoints | Harry Q. Lee, Boguslaw A. Swedek, Jeffrey Drue David | 2013-10-29 |
| 8562389 | Thin polishing pad with window and molding process | Jimin Zhang, Thomas H. Osterheld, Boguslaw A. Swedek | 2013-10-22 |
| 8563335 | Method of controlling polishing using in-situ optical monitoring and fourier transform | Boguslaw A. Swedek | 2013-10-22 |
| 8554351 | Spectrographic monitoring of a substrate during processing using index values | Jeffrey Drue David, Harry Q. Lee, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2013-10-08 |