Issued Patents All Time
Showing 26–50 of 105 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10559730 | Collimated LED light field display | Manivannan Thothadri, Robert Jan Visser, John M. White | 2020-02-11 |
| 10509328 | Fabrication and use of dose maps and feature size maps during substrate processing | Joseph R. Johnson | 2019-12-17 |
| 10503076 | Reserving spatial light modulator sections to address field non-uniformities | Joseph R. Johnson, Thomas Laidig | 2019-12-10 |
| 10495979 | Half tone scheme for maskless lithography | Joseph R. Johnson, Thomas Laidig | 2019-12-03 |
| 10495975 | Line edge roughness reduction via step size alteration | Thomas Laidig, Joseph R. Johnson | 2019-12-03 |
| 10488762 | Method to reduce data stream for spatial light modulator | Joseph R. Johnson, Thomas Laidig | 2019-11-26 |
| 10490599 | Collimated, directional micro-LED light field display | Manivannan Thothadri, Robert Jan Visser, John M. White | 2019-11-26 |
| 10474041 | Digital lithography with extended depth of focus | Guoheng Zhao, Jeremy Nesbitt, Mehdi Vaez-Iravani | 2019-11-12 |
| 10416550 | Method to reduce line waviness | Joseph R. Johnson, Thomas Laidig | 2019-09-17 |
| 10394130 | Quarter wave light splitting | Joseph R. Johnson, Dave Markle, Mehdi Vaez-Iravani | 2019-08-27 |
| 10289003 | Line edge roughness reduction via step size alteration | Thomas Laidig, Joseph R. Johnson | 2019-05-14 |
| 10256382 | Collimated OLED light field display | John M. White, Manivannan Thothadri, Robert Jan Visser | 2019-04-09 |
| 10108093 | Controlling photo acid diffusion in lithography processes | Peng Xie, Ludovic Godet | 2018-10-23 |
| 10073350 | Maskless lithography for web based processing | — | 2018-09-11 |
| 10014184 | Methods and apparatus for forming a resist array using chemical mechanical planarization | — | 2018-07-03 |
| 10014174 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | Bencherki Mebarki, Pramit Manna, Li Yan Miao, Deenesh Padhi, Bok Hoen Kim | 2018-07-03 |
| 10012910 | Pattern generators employing processors to vary delivery dose of writing beams according to photoresist thickness, and associated methods | — | 2018-07-03 |
| 9927696 | Method to reduce line waviness | Joseph R. Johnson, Thomas Laidig | 2018-03-27 |
| 9915621 | Extreme ultraviolet (EUV) substrate inspection system with simplified optics and method of manufacturing thereof | Majeed A. Foad, Christopher G. Talbot, John Christopher Moran | 2018-03-13 |
| 9823573 | Correction of non-uniform patterns using time-shifted exposures | Joseph R. Johnson, Thomas Laidig | 2017-11-21 |
| 9798240 | Controlling photo acid diffusion in lithography processes | Peng Xie, Ludovic Godet | 2017-10-24 |
| 9791786 | Method to reduce line waviness | Joseph R. Johnson, Thomas Laidig | 2017-10-17 |
| 9748148 | Localized stress modulation for overlay and EPE | Ellie Yieh, Huixiong Dai, Srinivas D. Nemani, Ludovic Godet | 2017-08-29 |
| 9659771 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | Bencherki Mebarki, Pramit Manna, Li Yan Miao, Deenesh Padhi, Bok Hoen Kim | 2017-05-23 |
| 9646642 | Resist fortification for magnetic media patterning | Roman Gouk, Steven Verhaverbeke, Li-Qun Xia, Yong Won Lee, Matthew D. Scotney-Castle +2 more | 2017-05-09 |