| 11195699 |
Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide |
Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Soonam Park |
2021-12-07 |
| 11164724 |
Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing |
Sang Won Kang, Nicholas Celeste, Peter M. Hillman, Douglas B. Hayden, Dongqing Yang |
2021-11-02 |
| 11158527 |
Thermal management systems and methods for wafer processing systems |
David Benjaminson |
2021-10-26 |
| 11130142 |
Showerhead having a detachable gas distribution plate |
Vladimir Knyazik, Hamid Noorbakhsh, Jason C. Della Rosa, Zheng John Ye, Jennifer Y. Sun +1 more |
2021-09-28 |
| 11101136 |
Process window widening using coated parts in plasma etch processes |
Dongqing Yang, Tien Fak Tan, Peter M. Hillman, Lala Zhu, Nitin K. Ingle +2 more |
2021-08-24 |
| 11062887 |
High temperature RF heater pedestals |
Soonam Park, David Benjaminson, Xikun Wang |
2021-07-13 |
| 11049698 |
Dual-channel showerhead with improved profile |
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2021-06-29 |
| 11049755 |
Semiconductor substrate supports with embedded RF shield |
David Benjaminson, Michael H. Grace, Soonam Park, Jaeyong Cho, Nikolai Kalnin +1 more |
2021-06-29 |
| 11024486 |
Semiconductor processing systems having multiple plasma configurations |
Xinglong Chen, Shankar Venkataraman |
2021-06-01 |
| 11004661 |
Process chamber for cyclic and selective material removal and etching |
Toan Q. Tran, Soonam Park, Junghoon Kim |
2021-05-11 |
| 10964512 |
Semiconductor processing chamber multistage mixing apparatus and methods |
Mehmet Tugrul Samir, Dongqing Yang |
2021-03-30 |
| 10920319 |
Ceramic showerheads with conductive electrodes |
Laksheswar Kalita, Soonam Park, Tien Fak Tan, LokKee Loh, Saravjeet Singh +1 more |
2021-02-16 |
| 10923367 |
Process chamber for etching low K and other dielectric films |
Srinivas D. Nemani, Ellie Yieh, Sergey G. Belostotskiy |
2021-02-16 |
| 10920320 |
Plasma health determination in semiconductor substrate processing reactors |
Junghoon Kim, Soonam Park, Tae Seung Cho, Nikolai Kalnin |
2021-02-16 |
| 10903052 |
Systems and methods for radial and azimuthal control of plasma uniformity |
Satoru Kobayashi, Hideo Sugai, Nikolai Kalnin, Soonam Park, Toan Q. Tran |
2021-01-26 |
