Issued Patents 2020
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10714371 | Method and apparatus for lithography in semiconductor fabrication | Chueh-Chi Kuo, Tsung-Yen Lee, Chia-Hsin CHOU, Tzung-Chi Fu, Li-Jui Chen +1 more | 2020-07-14 |
| 10712651 | Method and apparatus for collecting information used in image-error compensation | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2020-07-14 |
| 10687410 | Extreme ultraviolet radiation source and cleaning method thereof | Chi-Ming Yang, Sheng-Ta Lin, Shang-Chieh Chien, Li-Jui Chen | 2020-06-16 |
| 10684561 | Lithography method | Hao-Yu Lan, Ching-Juinn Huang, Tzung-Chi Fu, Tsung-Yen Lee | 2020-06-16 |
| 10678138 | Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiation | Wei-Chun Yen, Chi-Ming Yang, Shang-Chieh Chien, Li-Jui Chen | 2020-06-09 |
| 10678148 | Lithography system and lithography method | Kai-Chieh Chang, Tsung-Hsun Lee, Ching-Juinn Huang, Li-Jui Chen | 2020-06-09 |
| 10670970 | Lithography system and method thereof | Wei-Shin Cheng, Hsin-Feng Chen, Cheng-Hao LAI, Shao-Hua Wang, Han-Lung Chang +1 more | 2020-06-02 |
| 10663633 | Aperture design and methods thereof | Hung-Chih Hsieh, Kai-Chiang Wu, Yen-Liang Chen, Kai-Hsiung Chen, Chih-Ming Ke | 2020-05-26 |
| 10663871 | Reticle stage and method for using the same | Chia-Yu Lee, Tao Chen, Chia-Hao Hsu, Ching-Juinn Huang | 2020-05-26 |
| 10656539 | Radiation source for lithography process | Shang-Ying WU, Shang-Chieh Chien, Bo-Tsun Liu, Li-Jui Chen | 2020-05-19 |
| 10642158 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2020-05-05 |
| 10631392 | EUV collector contamination prevention | Ming-Fa Wu, Tzung-Chi Fu, Chun Che Lin, Huai-Tei Yang | 2020-04-21 |
| 10624196 | Laser source device and extreme ultraviolet lithography device | Henry Yee Shian Tong, Wen-Chih Wang, Hsin-Liang Chen, Louis Chun-Lin Chang, Cheng-Chieh Chen +2 more | 2020-04-14 |
| 10534279 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Chih-Tsung Shih, Li-Jui Chen, Shih-Chang Shih | 2020-01-14 |