Issued Patents 2020
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879124 | Method to form a fully strained channel region | Chun-Chieh Wang, Zheng-Yang Pan, Shahaji B. More, Shih-Chieh Chang, Cheng-Han Lee | 2020-12-29 |
| 10872769 | Formation and in-situ etching processes for metal layers | Po-Yu Lin, Chi-Yu Chou, Hsien-Ming Lee, Chun-Chieh Wang, Yueh-Ching Pai +3 more | 2020-12-22 |
| 10867799 | FinFET device and methods of forming same | Chun-Chieh Wang, Zheng-Yang Pan, Shih-Chieh Chang, Cheng-Han Lee, Shahaji B. More | 2020-12-15 |
| 10840358 | Method for manufacturing semiconductor structure with source/drain structure having modified shape | Shahaji B. More, Shih-Chieh Chang, Cheng-Han Lee | 2020-11-17 |
| 10749008 | Gate structure, semiconductor device and the method of forming semiconductor device | Chun Hsiung Tsai, Kuo-Feng Yu, Chien-Tai Chan, Ziwei Fang, Kei-Wei Chen | 2020-08-18 |
| 10679995 | Semiconductor device and method | Chun-Chieh Wang, Yueh-Ching Pai | 2020-06-09 |
| 10680106 | Method of forming source/drain epitaxial stacks | Shahaji B. More, Shih-Chieh Chang, Cheng-Han Lee | 2020-06-09 |
| 10665717 | Semiconductor device and FinFET device | Chun Hsiung Tsai, Chien-Tai Chan, Ziwei Fang, Kei-Wei Chen | 2020-05-26 |
| 10631392 | EUV collector contamination prevention | Ming-Fa Wu, Tzung-Chi Fu, Chun Che Lin, Po-Chung Cheng | 2020-04-21 |
| 10629700 | High-K metal gate process and device | Chien-Shun Liao, Wang Chun-Chieh, Yueh-Ching Pai, Chun-I Wu | 2020-04-21 |
| 10573749 | Fin-type field effect transistor structure and manufacturing method thereof | Chun Hsiung Tsai, Ziwei Fang, Shiu-Ko JangJian, Kei-Wei Chen, Ying-Lang Wang | 2020-02-25 |
| 10535736 | Fully strained channel | Shahaji B. More, Zheng-Yang Pan, Shih-Chieh Chang, Chun-Chieh Wang, Cheng-Han Lee | 2020-01-14 |
| 10535523 | Formation and in-situ etching processes for metal layers | Po-Yu Lin, Chi-Yu Chou, Hsien-Ming Lee, Chun-Chieh Wang, Yueh-Ching Pai +3 more | 2020-01-14 |