Issued Patents 2020
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879246 | Methods of fabricating semiconductor devices having gate-all-around structure with oxygen blocking layers | Chung-Liang Cheng | 2020-12-29 |
| 10872970 | Source and drain formation technique for fin-like field effect transistor | Chun Hsiung Tsai, Kuo-Feng Yu | 2020-12-22 |
| 10868171 | Semiconductor device structure with gate dielectric layer and method for forming the same | Chung-Liang Cheng | 2020-12-15 |
| 10868151 | Conformal transfer doping method for fin-like field effect transistor | Sai-Hooi Yeong, Sheng-Chen Wang, Bo-Yu Lai, Feng-Cheng Yang, Yen-Ming Chen | 2020-12-15 |
| 10868140 | Gap-filling germanium through selective bottom-up growth | De-Wei Yu, Chien-Hao Chen, Yee-Chia Yeo | 2020-12-15 |
| 10861751 | Method of semiconductor integrated circuit fabrication | De-Wei Yu, Chia Ping Lo, Liang-Gi Yao, Weng Chang, Yee-Chia Yeo | 2020-12-08 |
| 10854503 | Semiconductor structure with air gap and method sealing the air gap | Hung-Chang Sun, Akira Mineji | 2020-12-01 |
| 10854729 | Method to reduce etch variation using ion implantation | Tsan-Chun Wang, Chii-Horng Li, Tze-Liang Lee, Chao-Cheng Chen, Syun-Ming Jang | 2020-12-01 |
| 10847431 | Ion implantation methods and structures thereof | Tsan-Chun Wang, Chun Hsiung Tsai | 2020-11-24 |
| 10818768 | Method for forming metal cap layers to improve performance of semiconductor structure | Chung-Liang Cheng | 2020-10-27 |
| 10811253 | Methods of fabricating semiconductor devices having crystalline high-K gate dielectric layer | Chung-Liang Cheng | 2020-10-20 |
| 10770563 | Gate structure and patterning method for multiple threshold voltages | Chung-Liang Cheng | 2020-09-08 |
| 10749008 | Gate structure, semiconductor device and the method of forming semiconductor device | Chun Hsiung Tsai, Kuo-Feng Yu, Chien-Tai Chan, Kei-Wei Chen, Huai-Tei Yang | 2020-08-18 |
| 10720529 | Source/drain junction formation | Chun Hsiung Tsai, Sheng-Wen Yu | 2020-07-21 |
| 10720431 | Methods of fabricating semiconductor devices having gate-all-around structure with oxygen blocking layers | Chung-Liang Cheng | 2020-07-21 |
| 10707320 | Field effect transistors with ferroelectric dielectric materials | Cheng-Ming Lin, Kai Tak Lam, Sai-Hooi Yeong, Chi On Chui | 2020-07-07 |
| 10685867 | Method of semiconductor integrated circuit fabrication | De-Wei Yu, Tsu-Hsiu Perng | 2020-06-16 |
| 10686074 | Fin field effect transistor (FinFET) device structure with doped region in source/drain structure and method for forming the same | Chun Hsiung Tsai, Shahaji B. More, Cheng-Yi Peng, Yu-Ming Lin, Kuo-Feng Yu | 2020-06-16 |
| 10685884 | Semiconductor device including a Fin-FET and method of manufacturing the same | Yasutoshi Okuno, Cheng-Yi Peng, I-Ming Chang, Akira Mineji, Yu-Ming Lin +1 more | 2020-06-16 |
| 10665717 | Semiconductor device and FinFET device | Chun Hsiung Tsai, Chien-Tai Chan, Kei-Wei Chen, Huai-Tei Yang | 2020-05-26 |
| 10629596 | Fin-type field effect transistor structure and manufacturing method thereof | Chun Hsiung Tsai, Tsan-Chun Wang, Kei-Wei Chen | 2020-04-21 |
| 10573749 | Fin-type field effect transistor structure and manufacturing method thereof | Chun Hsiung Tsai, Shiu-Ko JangJian, Kei-Wei Chen, Huai-Tei Yang, Ying-Lang Wang | 2020-02-25 |
| 10541175 | Structure and formation method of semiconductor device with fin structures | Chung-Liang Cheng | 2020-01-21 |
| 10535557 | Interlayer dielectric film in semiconductor devices | Tsan-Chun Wang, De-Wei Yu, Yi-Fan Chen | 2020-01-14 |