Issued Patents 2020
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879075 | Wrap-around contact plug and method manufacturing same | Sung-Li Wang, Jyh-Cherng Sheu, Huang-Yi Huang, Chih-Wei Chang | 2020-12-29 |
| 10867859 | Methods of fabricating semiconductor devices having isolation structures with liners | Hsueh-Ju Chen, Xiong-Fei Yu, Yee-Chia Yeo, Huicheng Chang | 2020-12-15 |
| 10867807 | Semiconductor device and method | Ming-Jie Huang, Syun-Ming Jang, Ryan Chia-Jen Chen, Ming-Ching Chang, Shu-Yuan Ku +3 more | 2020-12-15 |
| 10861968 | Semiconductor device with negative capacitance structure and method for forming the same | Bo-Feng Young, Chih-Yu Chang, Sai-Hooi Yeong, Chih-Hao Wang | 2020-12-08 |
| 10861959 | Deposition selectivity enhancement and manufacturing method thereof | Bo-Cyuan Lu | 2020-12-08 |
| 10854521 | Low-k gate spacer and formation thereof | Bo-Cyuan Lu, Chunyao Wang, Jr-Hung Li, Chung-Ting Ko | 2020-12-01 |
| 10840357 | FinFET device and method of forming same | Chung-Ting Ko, Bo-Cyuan Lu, Jr-Hung Li | 2020-11-17 |
| 10833167 | Fin field effect transistor (finFET) device structure and method for forming the same | Sai-Hooi Yeong, Bo-Feng Young, Bo-Yu Lai, Kuan-Lun Cheng, Chih-Hao Wang | 2020-11-10 |
| 10818658 | Integrated circuit with a gate structure and method making the same | Kuo-Cheng Ching, Ying-Keung Leung | 2020-10-27 |
| 10804271 | Semiconductor structure and device each having differential etch stop layer over gate spacer | Chung-Ting Ko, Jr-Hung Li | 2020-10-13 |
| 10784359 | Non-conformal oxide liner and manufacturing methods thereof | Ming-Ho Lin, Chun-Heng Chen, Xiong-Fei Yu | 2020-09-22 |
| 10777504 | Interconnect structure for semiconductor device and methods of fabrication thereof | Chia-Ta Yu, Kai-Hsuan Lee, Yen-Ming Chen, Sai-Hooi Yeong | 2020-09-15 |
| 10763104 | Method of forming differential etch stop layer using directional plasma to activate surface on device structure | Chung-Ting Ko, Jr-Hung Li | 2020-09-01 |
| 10707334 | Reduction of fin loss in the formation of FinFETs | Yee-Chia Yeo | 2020-07-07 |
| 10707320 | Field effect transistors with ferroelectric dielectric materials | Cheng-Ming Lin, Kai Tak Lam, Sai-Hooi Yeong, Ziwei Fang | 2020-07-07 |
| 10686075 | Self-aligned gate hard mask and method forming same | Kai-Hsuan Lee, Bo-Yu Lai, Sheng-Chen Wang, Sai-Hooi Yeong, Yen-Ming Chen | 2020-06-16 |
| 10658234 | Formation method of interconnection structure of semiconductor device | Min-Hsiu Hung, Sung-Li Wang, Pei-Wen Wu, Yida Li, Chih-Wei Chang +4 more | 2020-05-19 |
| 10651171 | Integrated circuit with a gate structure and method making the same | Kuo-Cheng Ching, Ying-Keung Leung | 2020-05-12 |
| 10636664 | Wrap-around contact plug and method manufacturing same | Sung-Li Wang, Jyh-Cherng Sheu, Huang-Yi Huang, Chih-Wei Chang | 2020-04-28 |
| 10593775 | Semiconductor device and manufacturing method thereof | Yee-Chia Yeo, Sung-Li Wang, Jyh-Cherng Sheu, Hung-Li Chiang, I-Sheng Chen | 2020-03-17 |
| 10535569 | Forming transistor by selectively growing gate spacer | Kai-Hsuan Lee, Chia-Ta Yu, Cheng-Yu Yang, Sheng-Chen Wang, Bo-Yu Lai +4 more | 2020-01-14 |