SY

Sai-Hooi Yeong

TSMC: 20 patents #50 of 3,471Top 2%
📍 Dashulong, TW: #6 of 196 inventorsTop 4%
Overall (2020): #2,021 of 565,922Top 1%
20
Patents 2020

Issued Patents 2020

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
10879374 Semiconductor device and manufacturing method thereof Chih-Hao Yu, Sheng-Chen Wang 2020-12-29
10879238 Negative capacitance finFET and method of fabricating thereof Kuo-Cheng Ching, Kuan-Lun Cheng, Chih-Hao Wang, Tzer-Min Shen, Chi-Hsing Hsu 2020-12-29
10868006 FinFET transistor with fin back biasing Tsung-Yao Wen, Sheng-Chen Wang 2020-12-15
10868151 Conformal transfer doping method for fin-like field effect transistor Sheng-Chen Wang, Bo-Yu Lai, Ziwei Fang, Feng-Cheng Yang, Yen-Ming Chen 2020-12-15
10868149 Source and drain surface treatment for multi-gate field effect transistors Wei-Han Fan, Wei-Yuan Lu, Yu-Lin Yang, Chun-Hsiang Fan 2020-12-15
10861968 Semiconductor device with negative capacitance structure and method for forming the same Bo-Feng Young, Chih-Yu Chang, Chi On Chui, Chih-Hao Wang 2020-12-08
10861973 Negative capacitance transistor with a diffusion blocking layer Chi-Hsing Hsu, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang 2020-12-08
10840243 Semiconductor device and manufacturing method thereof Wei-Yuan Lu 2020-11-17
10833167 Fin field effect transistor (finFET) device structure and method for forming the same Chi On Chui, Bo-Feng Young, Bo-Yu Lai, Kuan-Lun Cheng, Chih-Hao Wang 2020-11-10
10833170 Low-k gate spacer and methods for forming the same Wen-Kai Lin, Bo-Yu Lai, Li Chun Te, Kai-Hsuan Lee, Tien-I Bao +1 more 2020-11-10
10811262 Semiconductor device having a uniform and thin silicide layer on an epitaxial source/ drain structure and manufacturing method thereof Kai-Hsuan Lee, Jyh-Cherng Sheu, Sung-Li Wang, Cheng-Yu Yang, Sheng-Chen Wang 2020-10-20
10777504 Interconnect structure for semiconductor device and methods of fabrication thereof Chia-Ta Yu, Kai-Hsuan Lee, Yen-Ming Chen, Chi On Chui 2020-09-15
10707320 Field effect transistors with ferroelectric dielectric materials Cheng-Ming Lin, Kai Tak Lam, Chi On Chui, Ziwei Fang 2020-07-07
10686075 Self-aligned gate hard mask and method forming same Kai-Hsuan Lee, Bo-Yu Lai, Sheng-Chen Wang, Yen-Ming Chen, Chi On Chui 2020-06-16
10680084 Epitaxial structures for fin-like field effect transistors Chia-Ta Yu, Sheng-Chen Wang, Feng-Cheng Yang, Yen-Ming Chen 2020-06-09
10629527 Method of manufacturing semiconductor device with multi wire structure Kuo-Yen Liu, Boo Yeh, Min-Chang Liang, Jui-Yao Lai, Ying-Yan Chen +1 more 2020-04-21
10535569 Forming transistor by selectively growing gate spacer Kai-Hsuan Lee, Chia-Ta Yu, Cheng-Yu Yang, Sheng-Chen Wang, Bo-Yu Lai +4 more 2020-01-14
10535525 Method for forming semiconductor device structure Chun-An Lin, Chun-Hsiung Lin, Kai-Hsuan Lee, Cheng-Yu Yang, Yen-Ting Chen 2020-01-14
10529725 Flexible merge scheme for source/drain epitaxy regions Kai-Hsuan Lee, Chia-Ta Yu, Cheng-Yu Yang, Sheng-Chen Wang, Feng-Cheng Yang +1 more 2020-01-07
10529803 Semiconductor device with epitaxial source/drain Chia-Ta Yu, Sheng-Chen Wang, Wei-Yuan Lu, Chien-I Kuo, Li-Li Su +2 more 2020-01-07