Issued Patents 2020
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10854729 | Method to reduce etch variation using ion implantation | Ziwei Fang, Chii-Horng Li, Tze-Liang Lee, Chao-Cheng Chen, Syun-Ming Jang | 2020-12-01 |
| 10854471 | Process for making multi-gate transistors and resulting structures | Su-Hao Liu, Liang-Yin Chen, Jing-Huei Huang, Lun-Kuang Tan, Huicheng Chang | 2020-12-01 |
| 10847431 | Ion implantation methods and structures thereof | Chun Hsiung Tsai, Ziwei Fang | 2020-11-24 |
| 10832913 | Method and apparatus for forming semiconductor structure | Chiao-Ting Tai, Che-Fu Chiu, Chun-Feng Nieh | 2020-11-10 |
| 10741412 | Gate structure of semiconductor device | Chun-Feng Nieh | 2020-08-11 |
| 10714598 | Method of manufacturing semiconductor device | Chun-Feng Nieh, Chiao-Ting Tai | 2020-07-14 |
| 10629596 | Fin-type field effect transistor structure and manufacturing method thereof | Chun Hsiung Tsai, Ziwei Fang, Kei-Wei Chen | 2020-04-21 |
| 10566242 | Minimization of plasma doping induced fin height loss | Chia-Ling Chan, Liang-Yin Chen, Huicheng Chang | 2020-02-18 |
| 10535557 | Interlayer dielectric film in semiconductor devices | De-Wei Yu, Ziwei Fang, Yi-Fan Chen | 2020-01-14 |