Issued Patents 2005
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6972576 | Electrical critical dimension measurement and defect detection for reticle fabrication | Christopher F. Lyons, Khoi A. Phan, Bhanwar Singh | 2005-12-06 |
| 6933219 | Tightly spaced gate formation through damascene process | Emmanuil H. Lingunis, Krishnashree Achuthan, Minh Van Ngo, Jean Y. Yang | 2005-08-23 |
| 6931618 | Feed forward process control using scatterometry for reticle fabrication | Bharath Rangarajan, Bhanwar Singh, Ramkumar Subramanian | 2005-08-16 |
| 6905971 | Treatment of dielectric material to enhance etch rate | Chih-Yuh Yang, William G. En, Joong S. Jeon, Minh Van Ngo, Ming-Ren Lin | 2005-06-14 |
| 6902966 | Low-temperature post-dopant activation process | Bin Yu, Robert B. Ogle, Eric N. Paton, Qi Xiang | 2005-06-07 |
| 6875664 | Formation of amorphous carbon ARC stack having graded transition between amorphous carbon and ARC material | Richard J. Huang, Srikanteswara Dakshina-Murthy, Philip A. Fisher, Lu You | 2005-04-05 |
| 6872647 | Method for forming multiple fins in a semiconductor device | Bin Yu, Judy Xilin An | 2005-03-29 |
| 6869734 | EUV reflective mask having a carbon film and a method of making such a mask | Christopher F. Lyons, Richard J. Huang | 2005-03-22 |
| 6867080 | Polysilicon tilting to prevent geometry effects during laser thermal annealing | Eric N. Paton, Robert B. Ogle, Qi Xiang, Bin Yu | 2005-03-15 |
| 6864164 | Finfet gate formation using reverse trim of dummy gate | Srikanteswara Dakshina-Murthy, Zoran Krivokapic | 2005-03-08 |
| 6855627 | Method of using amorphous carbon to prevent resist poisoning | Srikanteswara Dakshina-Murthy, Scott A. Bell, Richard J. Huang, Richard Nguyen | 2005-02-15 |
| 6855608 | Method of fabricating a planar structure charge trapping memory cell array with rectangular gates and reduced bit line resistance | Mark T. Ramsbey, Mark Randolph, Jean Y. Yang, Hiroyuki Kinoshita, Jeff P. Erhardt +3 more | 2005-02-15 |
| 6855582 | FinFET gate formation using reverse trim and oxide polish | Srikanteswara Dakshina-Murthy | 2005-02-15 |
| 6852455 | Amorphous carbon absorber/shifter film for attenuated phase shift mask | Christopher F. Lyons | 2005-02-08 |