Issued Patents 2005
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6905971 | Treatment of dielectric material to enhance etch rate | Cyrus E. Tabery, Chih-Yuh Yang, William G. En, Minh Van Ngo, Ming-Ren Lin | 2005-06-14 |
| 6902977 | Method for forming polysilicon gate on high-k dielectric and related structure | George Jonathan Kluth, Qi Xiang, Huicai Zhong | 2005-06-07 |
| 6872613 | Method for integrating metals having different work functions to form CMOS gates having a high-k gate dielectric and related structure | Qi Xiang, Huicai Zhong, Jung-Suk Goo, Allison Holbrook, George Jonathan Kluth | 2005-03-29 |
| 6849925 | Preparation of composite high-K/standard-K dielectrics for semiconductor devices | Arvind Halliyal, Minh Van Ngo, Robert B. Ogle | 2005-02-01 |