Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6902977 | Method for forming polysilicon gate on high-k dielectric and related structure | Joong S. Jeon, Qi Xiang, Huicai Zhong | 2005-06-07 |
| 6872613 | Method for integrating metals having different work functions to form CMOS gates having a high-k gate dielectric and related structure | Qi Xiang, Huicai Zhong, Jung-Suk Goo, Allison Holbrook, Joong S. Jeon | 2005-03-29 |
| 6841449 | Two-step process for nickel deposition | Jacques Bertrand | 2005-01-11 |