Issued Patents 2005
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6900002 | Antireflective bi-layer hardmask including a densified amorphous carbon layer | Marina V. Plat, Marilyn I. Wright, Lu You | 2005-05-31 |
| 6884733 | Use of amorphous carbon hard mask for gate patterning to eliminate requirement of poly re-oxidation | Srikanteswara Dakshina-Murthy, David E. Brown, Philip A. Fisher | 2005-04-26 |
| 6875668 | Notched gate structure fabrication | Khanh B. Nguyen | 2005-04-05 |
| 6864556 | CVD organic polymer film for advanced gate patterning | Lu You, Marina V. Plat, Chih-Yuh Yang, Richard J. Huang, Christopher F. Lyons +2 more | 2005-03-08 |
| 6855627 | Method of using amorphous carbon to prevent resist poisoning | Srikanteswara Dakshina-Murthy, Richard J. Huang, Richard Nguyen, Cyrus E. Tabery | 2005-02-15 |
| 6849530 | Method for semiconductor gate line dimension reduction | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Srikanteswara Dakshina-Murthy, Philip A. Fisher +1 more | 2005-02-01 |