Issued Patents 2005
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6913958 | Method for patterning a feature using a trimmed hardmask | Marilyn I. Wright, Chih-Yuh Yang, Douglas J. Bonser | 2005-07-05 |
| 6900002 | Antireflective bi-layer hardmask including a densified amorphous carbon layer | Marilyn I. Wright, Lu You, Scott A. Bell | 2005-05-31 |
| 6900124 | Patterning for elliptical Vss contact on flash memory | Hung-Eil Kim, Anna M. Minvielle, Christopher F. Lyons, Ramkumar Subramanian | 2005-05-31 |
| 6869888 | E-beam flood exposure of spin-on material to eliminate voids in vias | Ramkumar Subramanian, Christopher F. Lyons, Bhanwar Singh | 2005-03-22 |
| 6867097 | Method of making a memory cell with polished insulator layer | Mark T. Ramsbey, Robert B. Ogle, Tommy Hsiao, Angela T. Hui, Tuan Pham +1 more | 2005-03-15 |
| 6864556 | CVD organic polymer film for advanced gate patterning | Lu You, Chih-Yuh Yang, Scott A. Bell, Richard J. Huang, Christopher F. Lyons +2 more | 2005-03-08 |
| 6849530 | Method for semiconductor gate line dimension reduction | Douglas J. Bonser, Chih-Yuh Yang, Scott A. Bell, Srikanteswara Dakshina-Murthy, Philip A. Fisher +1 more | 2005-02-01 |