Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6884733 | Use of amorphous carbon hard mask for gate patterning to eliminate requirement of poly re-oxidation | Srikanteswara Dakshina-Murthy, Scott A. Bell, David E. Brown | 2005-04-26 |
| 6875664 | Formation of amorphous carbon ARC stack having graded transition between amorphous carbon and ARC material | Richard J. Huang, Srikanteswara Dakshina-Murthy, Cyrus E. Tabery, Lu You | 2005-04-05 |
| 6849530 | Method for semiconductor gate line dimension reduction | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Srikanteswara Dakshina-Murthy +1 more | 2005-02-01 |