Issued Patents 2005
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6939793 | Dual damascene integration scheme for preventing copper contamination of dielectric layer | Fei Wang, Christy Mei-Chu Woo | 2005-09-06 |
| 6900002 | Antireflective bi-layer hardmask including a densified amorphous carbon layer | Marina V. Plat, Marilyn I. Wright, Scott A. Bell | 2005-05-31 |
| 6893967 | L-shaped spacer incorporating or patterned using amorphous carbon or CVD organic materials | Marilyn I. Wright, Douglas J. Bonser, Kay Hellig | 2005-05-17 |
| 6875664 | Formation of amorphous carbon ARC stack having graded transition between amorphous carbon and ARC material | Richard J. Huang, Srikanteswara Dakshina-Murthy, Philip A. Fisher, Cyrus E. Tabery | 2005-04-05 |
| 6864556 | CVD organic polymer film for advanced gate patterning | Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Richard J. Huang, Christopher F. Lyons +2 more | 2005-03-08 |