Issued Patents All Time
Showing 76–100 of 162 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9167680 | Plasma processing apparatus, plasma generating apparatus, antenna structure and plasma generating method | Yohei Yamazawa, Takafumi Kimura | 2015-10-20 |
| 9163931 | Apparatus and method for measuring thickness and temperature and substrate processing system | Tatsuo Matsudo | 2015-10-20 |
| 9136097 | Shower plate and substrate processing apparatus | Kazuki Denpoh, Hiromasa Mochiki | 2015-09-15 |
| 9111747 | Film deposition apparatus, substrate processing apparatus and film deposition method | Jun Yamawaku, Mitsuhiro Tachibana, Hitoshi Kato, Takeshi Kobayashi, Shigehiro Miura +1 more | 2015-08-18 |
| 9028139 | Method of measuring temperature of component in processing chamber of substrate processing apparatus | Jun Yamawaku, Tatsuo Matsudo | 2015-05-12 |
| 9019505 | Temperature control system including sub-chiller | Jun Yamawaku, Tatsuo Matsudo, Kenji Nagai | 2015-04-28 |
| 8894806 | Plasma processing apparatus and plasma processing method | Yohei Yamazawa | 2014-11-25 |
| 8858753 | Focus ring heating method, plasma etching apparatus, and plasma etching method | Jun Yamawaku, Tatsuo Matsudo, Masashi Saito | 2014-10-14 |
| 8829387 | Plasma processing apparatus having hollow electrode on periphery and plasma control method | Kazuki Denpoh | 2014-09-09 |
| 8824875 | Method for heating part in processing chamber of semiconductor manufacturing apparatus and semiconductor manufacturing apparatus | Jun Yamawaku, Tatsuo Matsudo | 2014-09-02 |
| 8825434 | Temperature measuring method, storage medium, and program | Jun Yamawaku, Tatsuo Matsudo | 2014-09-02 |
| 8790490 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Ryuji Ohtani +6 more | 2014-07-29 |
| 8777483 | Temperature measuring apparatus and temperature measuring method | Jun Yamawaku, Tatsuo Matsudo, Kenji Nagai | 2014-07-15 |
| 8764288 | Temperature measuring apparatus and temperature measuring method | Jun Abe, Tatsuo Matsudo | 2014-07-01 |
| 8741095 | Plasma processing apparatus, plasma processing method, and computer readable storage medium | — | 2014-06-03 |
| 8741097 | Plasma processing apparatus and plasma processing method | Yohei Yamazawa, Masashi Saito, Kazuki Denpoh, Jun Yamawaku | 2014-06-03 |
| 8689733 | Plasma processor | Yohei Yamazawa | 2014-04-08 |
| 8608903 | Plasma processing apparatus and plasma processing method | Yohei Yamazawa, Masashi Saito, Kazuki Denpoh, Jun Yamawaku, Hachishiro Iizuka | 2013-12-17 |
| 8603293 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Ryuji Ohtani +11 more | 2013-12-10 |
| 8585284 | Temperature measurement apparatus and method | Jun Abe, Tatsuo Matsudo | 2013-11-19 |
| 8573837 | Temperature measuring apparatus and temperature measuring method | Tatsuo Matsudo | 2013-11-05 |
| 8523428 | Component in processing chamber of substrate processing apparatus and method of measuring temperature of the component | Jun Yamawaku, Tatsuo Matsudo | 2013-09-03 |
| 8513563 | Plasma processing apparatus and plasma processing method | Naoki Matsumoto, Yoshinobu Hayakawa, Hidetoshi Hanaoka, Manabu Iwata, Satoshi Tanaka | 2013-08-20 |
| 8506753 | Capacitive coupling plasma processing apparatus and method for using the same | Naoki Matsumoto, Akira Koshiishi | 2013-08-13 |
| 8486221 | Focus ring heating method, plasma etching apparatus, and plasma etching method | Jun Yamawaku, Tatsuo Matsudo, Masashi Saito | 2013-07-16 |