CK

Chishio Koshimizu

TL Tokyo Electron Limited: 156 patents #1 of 5,567Top 1%
TL Tokyo Electron Yamanashi Limited: 5 patents #3 of 138Top 3%
JT Japan Science And Technology: 4 patents #30 of 836Top 4%
HC Hitachi Construction Machinery Co.: 1 patents #701 of 1,234Top 60%
AT Agency Of Industrial Science And Technology: 1 patents #568 of 1,778Top 35%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
📍 Rifu, JP: #5 of 2,101 inventorsTop 1%
Overall (All Time): #5,255 of 4,157,543Top 1%
162
Patents All Time

Issued Patents All Time

Showing 126–150 of 162 patents

Patent #TitleCo-InventorsDate
7582182 Method and apparatus for measuring electron density of plasma and plasma processing apparatus Naoki Matsumoto, Yohei Yamazawa, Tatsuo Matsudo, Sumie Segawa 2009-09-01
7542148 Method for measuring physical quantity of measurement object in substrate processing apparatus and storage medium storing program for implementing the method Tomohiro Suzuki 2009-06-02
7532322 Method and apparatus for measuring electron density of plasma and plasma processing apparatus Tatsuo Matsudo, Sumie Segawa 2009-05-12
7527016 Plasma processing apparatus Yohei Yamazawa, Manabu Iwata, Fumihiko Higuchi, Akitaka Shimizu, Asao Yamashita +5 more 2009-05-05
7462293 Method and apparatus for measuring electron density of plasma and plasma processing apparatus Naoki Matsumoto, Yohei Yamazawa 2008-12-09
7446881 System, apparatus, and method for determining temperature/thickness of an object using light interference measurements Tomohiro Suzuki 2008-11-04
7416330 Method and apparatus for measuring temperature of substrate Masafumi Ito, Yasuyuki Okamura, Tatsuo Shiina, Nobuo Ishii, Tomohiro Suzuki 2008-08-26
7415940 Plasma processor Yohei Yamazawa 2008-08-26
7379189 Temperature/thickness measuring apparatus, temperature/thickness measuring method, temperature/thickness measuring system, control system and control method Tomohiro Suzuki 2008-05-27
7355715 Temperature measuring apparatus, temperature measurement method, temperature measurement system, control system and control method Tomohiro Suzuki 2008-04-08
7339656 Method and apparatus for measuring electron density of plasma and plasma processing apparatus Naoki Matsumoto, Yohei Yamazawa, Tatsuo Matsudo, Sumie Segawa 2008-03-04
7335278 Plasma processing apparatus and plasma processing method Hiroyuki Ishihara, Kimihiro Higuchi, Koji Maruyama 2008-02-26
7018506 Plasma processing apparatus Toshiaki Hongoh, Naoki Matsumoto 2006-03-28
6949165 Plasma processing apparatus 2005-09-27
6818560 Plasma processing apparatus and plasma processing method Kazunori Nagahata 2004-11-16
6773158 Resonant circuit for measuring temperature profile of a semiconductor substrate 2004-08-10
6676804 Method and apparatus for plasma processing Hiroyuki Ishihara, Kimihiro Higuchi, Koji Maruyama 2004-01-13
6576860 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Jun Ooyabu, Hideki Takeuchi, Akira Koshiishi 2003-06-10
6426477 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Jun Ooyabu, Hideki Takeuchi, Akira Koshiishi 2002-07-30
6297064 End point detecting method for semiconductor plasma processing 2001-10-02
6214162 Plasma processing apparatus 2001-04-10
6162323 Plasma processing apparatus 2000-12-19
6101970 Plasma processing apparatus 2000-08-15
6000360 Plasma processing apparatus 1999-12-14
5997687 Plasma processing apparatus 1999-12-07