TK

Takafumi Kimura

Fujitsu Limited: 5 patents #6,029 of 24,456Top 25%
TL Tokyo Electron Limited: 4 patents #1,723 of 5,567Top 35%
MC Morinaga Milk Industry Co.: 1 patents #142 of 303Top 50%
NC Noritsu Koki Co.: 1 patents #139 of 289Top 50%
OM Omron: 1 patents #1,808 of 3,089Top 60%
UK Ushio Denki Kabushiki Kaisha: 1 patents #309 of 583Top 55%
📍 Yamanashi, JP: #291 of 1,957 inventorsTop 15%
Overall (All Time): #381,395 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
9583312 Film formation device, substrate processing device, and film formation method Jun Yamawaku, Chishio Koshimizu, Yohei Yamazawa, Mitsuhiro Tachibana, Hitoshi Kato +2 more 2017-02-28
9236226 Plasma processing apparatus Jun Yamawaku, Chishio Koshimizu 2016-01-12
9167680 Plasma processing apparatus, plasma generating apparatus, antenna structure and plasma generating method Yohei Yamazawa, Chishio Koshimizu 2015-10-20
9111747 Film deposition apparatus, substrate processing apparatus and film deposition method Jun Yamawaku, Chishio Koshimizu, Mitsuhiro Tachibana, Hitoshi Kato, Takeshi Kobayashi +1 more 2015-08-18
8795750 Method for manufacturing low-phosphorus whey Nobuo Seki, Masatoshi Ohnishi, Kie Kinoshita, Yoshitaka Tamura, Hitoshi Saito +1 more 2014-08-05
7508306 Handheld RFID reader with display Hiroshi Fujii 2009-03-24
6949881 Discharge lamp of the short arc type Norihiro Inaoka 2005-09-27
6024503 Photograph developing apparatus Tsukasa Nakano, Tomoya Tanaka, Yoshifumi Nakamura, Junichi Miyai 2000-02-15
6025222 Vapor phase growth of a dielectric film and a fabrication process of a semiconductor device having such a dielectric film Hideaki Yamauchi, Masaaki Nakabayashi 2000-02-15
5183510 Apparatus and process for chemical vapor deposition 1993-02-02
5107119 Method of evaluating characteristics of superconductors and process and apparatus for forming superconductor film by using the method Hiroshi Nakao, Hideki Yamawaki, Masaru Ihara, Keigo NAGASAKA 1992-04-21
5037774 Process for the production of semiconductor devices utilizing multi-step deposition and recrystallization of amorphous silicon Hideki Yamawaki, Yoshihiro Arimoto, Shigeo Kodama, Masaru Ihara 1991-08-06
4931425 Process for chemical vapor deposition of superconductive oxide Hideki Yamawaki, Kazuto Ikeda, Masaru Ihara 1990-06-05