YA

Yoshihiro Arimoto

Fujitsu Limited: 14 patents #2,150 of 24,456Top 9%
IC Ishida Co.: 1 patents #174 of 307Top 60%
KK Kureha Kagaku Kogyo K.K.: 1 patents #68 of 125Top 55%
MC Mitsui Mining & Smelting Co.: 1 patents #444 of 838Top 55%
TT Tokyo Institute Of Technology: 1 patents #411 of 1,159Top 40%
Overall (All Time): #300,884 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
7674634 Method of producing semiconductor device Kenji Maruyama, Masaki Kurasawa, Masao Kondo 2010-03-09
7465980 Ferroelectric memory, multivalent data recording method and multivalent data reading method Hiroshi Ishihara, Tetsuro Tamura, Hiromasa Hoko, Koji Aizawa, Yoshiaki Tabuchi +4 more 2008-12-16
6686048 Composite carbonaceous heat insulator Yukihiro Sibuya, Masanori Kobayashi, Shigeki Iwamoto 2004-02-03
6159858 Slurry containing manganese oxide and a fabrication process of a semiconductor device using such a slurry Sadahiro Kishii, Ko Nakamura, Akiyoshi Hatada, Rintaro Suzuki, Naruo Ueda +1 more 2000-12-12
6114247 Polishing cloth for use in a CMP process and a surface treatment thereof Ko Nakamura, Sadahiro Kishii 2000-09-05
5904609 Polishing apparatus and polishing method Atsushi Fukuroda, Ko Nakamura 1999-05-18
5877089 Slurry containing manganese oxide Sadahiro Kishii, Akiyoshi Hatada, Rintaro Suzuki, Hiroshi Horie, Ko Nakamura 1999-03-02
5763325 Fabrication process of a semiconductor device using a slurry containing manganese oxide Sadahiro Kishii, Akiyoshi Hatada, Rintaro Suzuki, Hiroshi Horie, Ko Nakamura 1998-06-09
5760343 Combinational weighing systems and methods for automatically aligning weighed article batches Kenzo Tsuzuike, Michihiko Yonetsu, Yoshiharu Asai 1998-06-02
5624300 Apparatus and method for uniformly polishing a wafer Sadahiro Kishii 1997-04-29
5621239 SOI device having a buried layer of reduced resistivity Hiroshi Horie, Atsushi Fukuroda 1997-04-15
5562529 Apparatus and method for uniformly polishing a wafer Sadahiro Kishii, Hiroshi Horie, Fumitoshi Sugimoto 1996-10-08
5506433 Composite semiconductor substrate having a single crystal substrate and a single crystal layer formed thereon Tatsuya Ohori, Isamu Hanyu, Fumitoshi Sugimoto 1996-04-09
5413951 Composite semiconductor substrate and a fabrication process thereof Tatsuya Ohori, Isamu Hanyu, Fumitoshi Sugimoto 1995-05-09
5399233 Method of and apparatus for manufacturing a semiconductor substrate Maki Murazumi, Atsushi Fukuroda 1995-03-21
5037774 Process for the production of semiconductor devices utilizing multi-step deposition and recrystallization of amorphous silicon Hideki Yamawaki, Shigeo Kodama, Takafumi Kimura, Masaru Ihara 1991-08-06