Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8791561 | Semiconductor device and its manufacture method | Tsuyoshi Kanki, Yoshihiro Nakata, Yasushi Kobayashi, Masato Tanaka, Akio Rokugawa | 2014-07-29 |
| 8702826 | Abrasive agent, method for producing abrasive agents, and electronic device | — | 2014-04-22 |
| 8399295 | Semiconductor device and its manufacture method | Tsuyoshi Kanki, Yoshihiro Nakata, Yasushi Kobayashi, Masato Tanaka, Akio Rokugawa | 2013-03-19 |
| 8067791 | Semiconductor device and method for fabricating the same | Hiroshi Kudo, Junko Naganuma | 2011-11-29 |
| 7951686 | Method of manufacturing semiconductor device having device characteristics improved by straining surface of active region | Hirofumi Watatani, Masanori Terahara, Ryo Tanabe, Kaina Suzuki, Shigeo Satoh | 2011-05-31 |
| 7701016 | Semiconductor device having device characteristics improved by straining surface of active region and its manufacture method | Hirofumi Watatani, Masanori Terahara, Ryo Tanabe, Kaina Suzuki, Shigeo Satoh | 2010-04-20 |
| 7642577 | Semiconductor device and method for fabricating the same | Hiroshi Kudo, Junko Naganuma | 2010-01-05 |
| 7637270 | Method of washing a polished object | — | 2009-12-29 |
| 7501686 | Semiconductor device and method for manufacturing the same | Masaki Okuno, Hiroshi Morioka, Masanori Terahara, Shigeo Satoh, Kaina Suzuki | 2009-03-10 |
| 7064038 | Semiconductor device and method for fabricating the same | Hiroshi Kudo, Junko Naganuma | 2006-06-20 |
| 6159858 | Slurry containing manganese oxide and a fabrication process of a semiconductor device using such a slurry | Ko Nakamura, Yoshihiro Arimoto, Akiyoshi Hatada, Rintaro Suzuki, Naruo Ueda +1 more | 2000-12-12 |
| 6114247 | Polishing cloth for use in a CMP process and a surface treatment thereof | Ko Nakamura, Yoshihiro Arimoto | 2000-09-05 |
| 5877089 | Slurry containing manganese oxide | Akiyoshi Hatada, Rintaro Suzuki, Hiroshi Horie, Yoshihiro Arimoto, Ko Nakamura | 1999-03-02 |
| 5763325 | Fabrication process of a semiconductor device using a slurry containing manganese oxide | Akiyoshi Hatada, Rintaro Suzuki, Hiroshi Horie, Yoshihiro Arimoto, Ko Nakamura | 1998-06-09 |
| 5624300 | Apparatus and method for uniformly polishing a wafer | Yoshihiro Arimoto | 1997-04-29 |
| 5562529 | Apparatus and method for uniformly polishing a wafer | Yoshihiro Arimoto, Hiroshi Horie, Fumitoshi Sugimoto | 1996-10-08 |
| 5227339 | Method of manufacturing semiconductor substrate and method of manufacturing semiconductor device composed of the substrate | — | 1993-07-13 |