Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6986973 | Test photomask, flare evaluation method, and flare compensation method | Teruyoshi Yao, Katsuyoshi Kirikoshi | 2006-01-17 |
| 6420094 | Optical exposure method | Tamae Haruki, Kenji Nakagawa, Satoru Asai | 2002-07-16 |
| 6207342 | Chemically amplified resist material and process for the formation of resist patterns | Satoshi Takechi | 2001-03-27 |
| 6045976 | Optical exposure method | Tamae Haruki, Kenji Nakagawa, Masao Taguchi, Hiroyuki Tanaka, Satoru Asai | 2000-04-04 |
| 5876877 | Patterned mask having a transparent etching stopper layer | Mitsuji Nunokawa, Satoru Asai | 1999-03-02 |
| 5607821 | Optical exposure method | Tamae Haruki, Kenji Nakagawa, Masao Taguchi, Hiroyuki Tanaka, Satoru Asai | 1997-03-04 |
| 5561010 | Phase shift optical mask and method of correcting defects in optical mask | Satoru Asai | 1996-10-01 |
| 5506433 | Composite semiconductor substrate having a single crystal substrate and a single crystal layer formed thereon | Tatsuya Ohori, Fumitoshi Sugimoto, Yoshihiro Arimoto | 1996-04-09 |
| 5465220 | Optical exposure method | Tamae Haruki, Kenji Nakagawa, Masao Taguchi, Hiroyuki Tanaka, Satoru Asai | 1995-11-07 |
| 5428478 | Optical mask and exposure method using the optical mask | Satoru Asai | 1995-06-27 |
| 5418093 | Projection exposure method and an optical mask for use in projection exposure | Satoru Asai, Mitsuji Nunokawa | 1995-05-23 |
| 5413951 | Composite semiconductor substrate and a fabrication process thereof | Tatsuya Ohori, Fumitoshi Sugimoto, Yoshihiro Arimoto | 1995-05-09 |
| 5368963 | Photomask and method of fabricating the same | Satoru Asai | 1994-11-29 |