Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8257909 | Method of manufacturing semiconductor device, and method of forming resist pattern | Hajime Yamamoto | 2012-09-04 |
| 7465529 | Radiation sensitive material and method for forming pattern | Makoto Takahashi, Yuko Kaimoto | 2008-12-16 |
| 7179580 | Radiation sensitive material and method for forming pattern | Makoto Takahashi, Yuko Kaimoto | 2007-02-20 |
| 7129017 | Chemically amplified resist composition and method for forming patterned film using same | Hajime Yamamoto, Kenichi Murakami | 2006-10-31 |
| 7060635 | Method of manufacturing semiconductor device and method of forming pattern | Akihiko Otoguro, Takatoshi Deguchi | 2006-06-13 |
| 6902859 | Chemically amplified resist composition and method for forming patterned film using same | Hajime Yamamoto, Kenichi Murakami | 2005-06-07 |
| 6887649 | Multi-layered resist structure and manufacturing method of semiconductor device | Akihiko Otoguro | 2005-05-03 |
| 6790580 | Resist material and method for forming a resist pattern with the resist material | — | 2004-09-14 |
| 6790589 | Radiation sensitive material and method for forming pattern | Makoto Takahashi, Yuko Kaimoto | 2004-09-14 |
| 6699645 | Method for the formation of resist patterns | Makoto Takahashi | 2004-03-02 |
| 6344304 | Radiation sensitive material and method for forming pattern | Makoto Takahashi, Yuko Kaimoto | 2002-02-05 |
| 6329125 | Chemically amplified resist compositions and process for the formation of resist patterns | Akiko Kotachi, Koji Nozaki, Ei Yano, Keiji Watanabe, Takahisa Namiki +3 more | 2001-12-11 |
| 6248920 | Preparation process for esters and resist materials | Tadashi Kikukawa | 2001-06-19 |
| 6207342 | Chemically amplified resist material and process for the formation of resist patterns | Isamu Hanyu | 2001-03-27 |
| 6200725 | Chemically amplified resist compositions and process for the formation of resist patterns | Akiko Kotachi, Koji Nozaki, Ei Yano, Keiji Watanabe, Takahisa Namiki +3 more | 2001-03-13 |
| 6120977 | Photoresist with bleaching effect | Yuko Kaimoto, Akira Oikawa | 2000-09-19 |
| 6013416 | Chemically amplified resist compositions and process for the formation of resist patterns | Koji Nozaki, Ei Yano, Keiji Watanabe, Takahisa Namiki, Miwa Igarashi +3 more | 2000-01-11 |
| 6004720 | Radiation sensitive material and method for forming pattern | Makoto Takahashi, Yuko Kaimoto | 1999-12-21 |
| 5968713 | Chemically amplified resist compositions and process for the formation of resist patterns | Koji Nozaki, Ei Yano, Keiji Watanabe, Takahisa Namiki, Miwa Igarashi +3 more | 1999-10-19 |
| 5879851 | Method for forming resist patterns by using an ammonium or morpholine compound as a developer | Makoto Takahashi | 1999-03-09 |
| 5856071 | Resist material including si-containing resist having acid removable group combined with photo-acid generator | Akiko Kotachi | 1999-01-05 |
| 5506088 | Chemically amplified resist composition and process for forming resist pattern using same | Koji Nozaki, Ryosuke Tokutomi, Yuko Kaimoto | 1996-04-09 |
| 5443690 | Pattern formation material and pattern formation method | Makoto Takahashi, Yuko Kaimoto | 1995-08-22 |
| 5403699 | Process for formation of resist patterns | Yuko Nakamura, Akiko Kotachi | 1995-04-04 |
| 5326670 | Process for forming resist pattern | Akiko Kotachi | 1994-07-05 |