Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11973486 | Electronic component and method for manufacturing the same | Sinichiro Kitanishi | 2024-04-30 |
| 10193528 | Acoustic wave device and acoustic wave module | — | 2019-01-29 |
| 9773964 | Electronic component | Eiji Sakata | 2017-09-26 |
| 9386703 | Electronic device | — | 2016-07-05 |
| D748095 | Spherical stylus | — | 2016-01-26 |
| 8787030 | Multilayer circuit board with resin bases and separators | — | 2014-07-22 |
| 7513022 | Method for manufacturing surface acoustic wave device | Mitsutaka Shimada, Yoshifumi Yamagata, Kazuhiro Otsuka, Masafumi Hisataka, Michihiko Kuwahata +1 more | 2009-04-07 |
| 7353710 | Pressure sensor device with surface acoustic wave elements | Kaoru Matsuo, Hiroshi Tachioka | 2008-04-08 |
| 7154206 | Surface acoustic wave device and method for manufacturing same | Mitsutaka Shimada, Yoshifumi Yamagata, Kazuhiro Otsuka, Masafumi Hisataka, Michihiko Kuwahata +1 more | 2006-12-26 |
| 6127098 | Method of making resist patterns | Kenji Nakagawa, Ei Yano, Masao Kanazawa, Hiroshi Kudo | 2000-10-03 |
| 6120977 | Photoresist with bleaching effect | Yuko Kaimoto, Satoshi Takechi | 2000-09-19 |
| 5723259 | Negative type composition for chemically amplified resist and process and apparatus of formation of chemically amplified resist pattern | Hiroyuki Tanaka, Hideyuki Matsuda | 1998-03-03 |
| 5707784 | Method of forming chemically amplified resist pattern and manufacturing for semiconductor device by using the chemically amplified resist pattern | Hiroyuki Tanaka, Masayuki Oie, Hideyuki Tanaka, Nobunori Abe | 1998-01-13 |
| 5693145 | Apparatus of formation of chemically amplified resist pattern | Hiroyuki Tanaka, Hideyuki Matsuda | 1997-12-02 |
| 5688628 | Resist composition | Masayuki Oie, Nobunori Abe, Hideyuki Tanaka, Shuichi Miyata | 1997-11-18 |
| 5484687 | Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof | Keiji Watanabe, Shun-ichi Fukuyama, Masaaki Yamagami, Takahisa Namiki | 1996-01-16 |
| 5240813 | Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof | Keiji Watanabe, Shun-ichi Fukuyama, Masaaki Yamagami, Takahisa Namiki | 1993-08-31 |
| 4219066 | Pneumatic tire having a sidewall protect rib provided with an articular part or groove | Akira Tamura, Yasuo Suzuki | 1980-08-26 |