Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5773190 | Resist composition | Hideyuki Tanaka, Nobunori Abe | 1998-06-30 |
| 5707784 | Method of forming chemically amplified resist pattern and manufacturing for semiconductor device by using the chemically amplified resist pattern | Akira Oikawa, Hiroyuki Tanaka, Hideyuki Tanaka, Nobunori Abe | 1998-01-13 |
| 5688628 | Resist composition | Nobunori Abe, Hideyuki Tanaka, Akira Oikawa, Shuichi Miyata | 1997-11-18 |
| 5532107 | Positive resist composition | Shoji Kawata, Takamasa Yamada, Shinya Ikeda | 1996-07-02 |
| 5306596 | Positive resist composition comprising a polyphenolic o-quinone diazide sulfonate | Shoji Kawata, Takamasa Yamada, Shinya Ikeda | 1994-04-26 |
| 5166033 | Positive resist composition containing quinone diazide sulfonate ester of vinylphenol compounds or isopropenylphenol compounds | Shoji Kawata, Takamasa Yamada | 1992-11-24 |
| 5112719 | Positive resist composition containing alkali-soluble phenolic resin, quinonediazide sulfonic acid ester photosensitive agent and polyhydroxy sensitizer | Takamasa Yamada, Shoji Kawata | 1992-05-12 |
| 4654292 | Photoresist composition containing a pyrazole compound anti-halation agent | Satoshi Ogawa, Sadao Sugimoto, Masahiro Yamazaki, Katsuhiro Fujino | 1987-03-31 |