Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11505121 | Mounting assembly of lighting device and vehicular interior component | Akifumi Hori, Ai Morishima, Hiroyasu Tahara | 2022-11-22 |
| 11268218 | Woven fabric | Takayoshi Yamamoto, Junnji Ikeda, Mitsutaka SAKOH | 2022-03-08 |
| 10975503 | Skin material for vehicle interior | Hirohiko Sakai, Takayoshi Yamamoto | 2021-04-13 |
| 10906460 | Skin material for vehicle interior | Atsuhiko Ito, Takayoshi Yamamoto, Hirohiko Sakai, Kousei Egawa | 2021-02-02 |
| 10703264 | Interior part combined structure | — | 2020-07-07 |
| 10549684 | Skin material for vehicle interior | Seiji Chaza, Shingo Okahara, Mitsutaka SAKOH, Hideo Kanamori, Atsuhiko Ito +1 more | 2020-02-04 |
| 10480775 | Light emitting decoration, method for laying light emitting decoration, laying object and method for forming light emitting design | — | 2019-11-19 |
| 10328850 | Skin material for vehicle interior | Hirohiko Sakai, Takayoshi Yamamoto | 2019-06-25 |
| 10228515 | Woven fabric | Atsuhiko Ito, Takayoshi Yamamoto | 2019-03-12 |
| 10145038 | Woven fabric, method for manufacturing design woven fabric and method for manufacturing interior material | Shingo Okahara, Mitsutaka SAKOH, Hideo Kanamori, Atsuhiko Ito, Takayoshi Yamamoto | 2018-12-04 |
| 10132014 | Woven fabric | Atsuhiko Ito, Takayoshi Yamamoto | 2018-11-20 |
| 10054729 | Illumination apparatus | Seiji Chaza, Shingo Okahara, Mitsutaka SAKOH, Hideo Kanamori, Atsuhiko Ito | 2018-08-21 |
| 5532107 | Positive resist composition | Masayuki Oie, Shoji Kawata, Shinya Ikeda | 1996-07-02 |
| 5306596 | Positive resist composition comprising a polyphenolic o-quinone diazide sulfonate | Masayuki Oie, Shoji Kawata, Shinya Ikeda | 1994-04-26 |
| 5166033 | Positive resist composition containing quinone diazide sulfonate ester of vinylphenol compounds or isopropenylphenol compounds | Masayuki Oie, Shoji Kawata | 1992-11-24 |
| 5112719 | Positive resist composition containing alkali-soluble phenolic resin, quinonediazide sulfonic acid ester photosensitive agent and polyhydroxy sensitizer | Shoji Kawata, Masayuki Oie | 1992-05-12 |