Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7754619 | Method for forming a coating with a liquid, and method for manufacturing a semiconductor device | Tomoaki Muramatsu, Ichiro Omata | 2010-07-13 |
| 7465529 | Radiation sensitive material and method for forming pattern | Satoshi Takechi, Makoto Takahashi | 2008-12-16 |
| 7179580 | Radiation sensitive material and method for forming pattern | Satoshi Takechi, Makoto Takahashi | 2007-02-20 |
| 6790589 | Radiation sensitive material and method for forming pattern | Satoshi Takechi, Makoto Takahashi | 2004-09-14 |
| 6344304 | Radiation sensitive material and method for forming pattern | Satoshi Takechi, Makoto Takahashi | 2002-02-05 |
| 6120977 | Photoresist with bleaching effect | Satoshi Takechi, Akira Oikawa | 2000-09-19 |
| 6004720 | Radiation sensitive material and method for forming pattern | Satoshi Takechi, Makoto Takahashi | 1999-12-21 |
| 5660969 | Chemical amplification resist and a fabrication process of a semiconductor device that uses such a chemical amplification resist | — | 1997-08-26 |
| 5585219 | Resist composition and process for forming resist pattern | Koji Nozaki | 1996-12-17 |
| 5585222 | Resist composition and process for forming resist pattern | Koji Nozaki | 1996-12-17 |
| 5506088 | Chemically amplified resist composition and process for forming resist pattern using same | Koji Nozaki, Ryosuke Tokutomi, Satoshi Takechi | 1996-04-09 |
| 5443690 | Pattern formation material and pattern formation method | Satoshi Takechi, Makoto Takahashi | 1995-08-22 |