Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6329125 | Chemically amplified resist compositions and process for the formation of resist patterns | Satoshi Takechi, Koji Nozaki, Ei Yano, Keiji Watanabe, Takahisa Namiki +3 more | 2001-12-11 |
| 6200725 | Chemically amplified resist compositions and process for the formation of resist patterns | Satoshi Takechi, Koji Nozaki, Ei Yano, Keiji Watanabe, Takahisa Namiki +3 more | 2001-03-13 |
| 6013416 | Chemically amplified resist compositions and process for the formation of resist patterns | Koji Nozaki, Ei Yano, Keiji Watanabe, Takahisa Namiki, Miwa Igarashi +3 more | 2000-01-11 |
| 5968713 | Chemically amplified resist compositions and process for the formation of resist patterns | Koji Nozaki, Ei Yano, Keiji Watanabe, Takahisa Namiki, Miwa Igarashi +3 more | 1999-10-19 |
| 5856071 | Resist material including si-containing resist having acid removable group combined with photo-acid generator | Satoshi Takechi | 1999-01-05 |
| 5403699 | Process for formation of resist patterns | Satoshi Takechi, Yuko Nakamura | 1995-04-04 |
| 5326670 | Process for forming resist pattern | Satoshi Takechi | 1994-07-05 |
| 5192643 | Pattern-forming method and radiation resist for use when working this pattern-forming method | Satoshi Takechi | 1993-03-09 |
| 5153103 | Resist composition and pattern formation process | Satoshi Takechi | 1992-10-06 |
| 5104479 | Resist material for energy beam lithography and method of using the same | Satoshi Takechi, Yuko Nakamura | 1992-04-14 |
| 5066751 | Resist material for energy beam lithography and method of using the same | Satoshi Takechi, Yuko Nakamura | 1991-11-19 |