Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6420094 | Optical exposure method | Kenji Nakagawa, Satoru Asai, Isamu Hanyu | 2002-07-16 |
| 6099582 | Automatic revision of semiconductor device layout for solving contradiction | — | 2000-08-08 |
| 6045976 | Optical exposure method | Kenji Nakagawa, Masao Taguchi, Hiroyuki Tanaka, Satoru Asai, Isamu Hanyu | 2000-04-04 |
| 5867401 | Phase shifter arranging method and computer readable medium storing program for carrying out the method | — | 1999-02-02 |
| 5698859 | Method and device for proximity-effect correction | — | 1997-12-16 |
| 5637424 | Fine pattern lithography with positive use of interference | Kenji Nakagawa | 1997-06-10 |
| 5607821 | Optical exposure method | Kenji Nakagawa, Masao Taguchi, Hiroyuki Tanaka, Satoru Asai, Isamu Hanyu | 1997-03-04 |
| 5472813 | Pattern exposing method using phase shift and mask used therefor | Kenji Nakagawa, Masao Kanazawa, Yasuko Tabata | 1995-12-05 |
| 5465220 | Optical exposure method | Kenji Nakagawa, Masao Taguchi, Hiroyuki Tanaka, Satoru Asai, Isamu Hanyu | 1995-11-07 |
| 5415952 | Fine pattern lithography with positive use of interference | Kenji Nakagawa | 1995-05-16 |
| 5364716 | Pattern exposing method using phase shift and mask used therefor | Kenji Nakagawa, Masao Kanazawa, Yasuko Tabata | 1994-11-15 |