Issued Patents All Time
Showing 51–75 of 162 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10777392 | Substrate processing apparatus | Jun Yamawaku | 2020-09-15 |
| 10685859 | Plasma processing apparatus | Tatsuo Matsudo | 2020-06-16 |
| 10672589 | Plasma processing apparatus and control method | Shin Hirotsu | 2020-06-02 |
| 10546727 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Ryuji Ohtani +11 more | 2020-01-28 |
| 10529539 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Ryuji Ohtani +10 more | 2020-01-07 |
| 10529596 | Capacitive coupling plasma processing apparatus and method for using the same | Naoki Matsumoto, Akira Koshiishi | 2020-01-07 |
| 10325758 | Plasma processing apparatus | Jun Yamawaku, Tatsuo Matsudo | 2019-06-18 |
| 10283328 | Plasma processing apparatus and plasma processing method | Jun Yamawaku, Tatsuo Matsudo | 2019-05-07 |
| 10211031 | Plasma processing apparatus and plasma processing method | Jun Yamawaku | 2019-02-19 |
| 9997332 | Plasma processing apparatus and plasma processing method | Yohei Yamazawa, Masashi Saito, Kazuki Denpoh, Jun Yamawaku | 2018-06-12 |
| 9952032 | Temperature measuring method, substrate processing system and component to be provided in substrate processing apparatus of the substrate processing system | Tatsuo Matsudo | 2018-04-24 |
| 9941097 | Plasma processing apparatus | Yohei Yamazawa, Masashi Saito, Kazuki Denpoh, Jun Yamawaku | 2018-04-10 |
| 9899191 | Plasma processing apparatus | Yohei Yamazawa, Masashi Saito, Kazuki Denpoh, Jun Yamawaku | 2018-02-20 |
| 9607866 | Capacitive coupling plasma processing apparatus and method for using the same | Naoki Matsumoto, Akira Koshiishi | 2017-03-28 |
| 9583312 | Film formation device, substrate processing device, and film formation method | Jun Yamawaku, Yohei Yamazawa, Mitsuhiro Tachibana, Hitoshi Kato, Takeshi Kobayashi +2 more | 2017-02-28 |
| 9500537 | Temperature measurement apparatus and method | Jun Abe, Tatsuo Matsudo | 2016-11-22 |
| 9502215 | Plasma processing apparatus and plasma processing method | Hitoshi Kato, Shigehiro Miura, Jun Yamawaku, Yohei Yamazawa | 2016-11-22 |
| 9490105 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Ryuji Ohtani +11 more | 2016-11-08 |
| 9459159 | Heat-flux measuring method, substrate processing system, and heat-flux measuring member | Tatsuo Matsudo | 2016-10-04 |
| 9349618 | Substrate processing apparatus | Jun Yamawaku | 2016-05-24 |
| 9313872 | Plasma processing apparatus and plasma processing method | Yohei Yamazawa, Kazuki Denpoh, Jun Yamawaku, Masashi Saito | 2016-04-12 |
| 9304050 | Temperature measurement apparatus and method | Jun Abe, Tatsuo Matsudo | 2016-04-05 |
| 9253867 | Plasma processing apparatus and plasma processing method | Yohei Yamazawa, Masashi Saito, Kazuki Denpoh, Jun Yamawaku | 2016-02-02 |
| 9236226 | Plasma processing apparatus | Jun Yamawaku, Takafumi Kimura | 2016-01-12 |
| 9207689 | Substrate temperature control method and plasma processing apparatus | — | 2015-12-08 |