Issued Patents All Time
Showing 126–150 of 168 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9159577 | Method of forming substrate pattern | Chun Lin, Feng-Yuan Chiu, Bing Yeh, Yi-Jie Chen, Ying-Chou Cheng +2 more | 2015-10-13 |
| 9158884 | Method and system for repairing wafer defects | Chih-Ming Lai, Hung-Chang Hsieh | 2015-10-13 |
| 9159557 | Systems and methods for mitigating print-out defects | — | 2015-10-13 |
| 9153478 | Spacer etching process for integrated circuit design | Ru-Gun Liu, Ken-Hsien Hsieh, Ming-Feng Shieh, Chih-Ming Lai, Tsai-Sheng Gau +6 more | 2015-10-06 |
| 9095132 | Animal trap device | Li Fang | 2015-08-04 |
| 9081289 | System and method for optimization of an imaged pattern of a semiconductor device | Ying-Hao Su, Tzu-Chun Lo, Ming-Yo Chung | 2015-07-14 |
| 9070630 | Mechanisms for forming patterns | Ru-Gun Liu, Chung-Te Lin, Ming-Feng Shieh, Tsai-Sheng Gau | 2015-06-30 |
| 9069249 | Self aligned patterning with multiple resist layers | Ming-Feng Shieh, Ken-Hsien Hsieh, Chih-Ming Lai, Ru-Gun Liu | 2015-06-30 |
| 9053279 | Pattern modification with a preferred position function | Ken-Hsien Hsieh | 2015-06-09 |
| 9040433 | Photo resist trimmed line end space | Chia-Ying Lee, Jyu-Horng Shieh, Ming-Feng Shieh, Chih-Ming Lai, Ken-Hsien Hsieh +1 more | 2015-05-26 |
| 9026956 | Method of lithographic process evaluation | Chia-Cheng Chang, Wei-Kuan Yu, Tsai-Ming Huang, Chin-Min Huang, Cherng-Shyan Tsay +2 more | 2015-05-05 |
| 8962464 | Self-alignment for using two or more layers and methods of forming same | Ru-Gun Liu, Ken-Hsien Hsieh, Ming-Feng Shieh, Chih-Ming Lai, Tsai-Sheng Gau | 2015-02-24 |
| 8907497 | Semiconductor device with self-aligned interconnects and blocking portions | Ken-Hsien Hsieh, Tsong-Hua Ou, Ru-Gun Liu, Fang-Yu Fan, Yuan-Te Hou | 2014-12-09 |
| 8888948 | Apparatus and method for controlling relative particle concentrations in a plasma | Chi-Lun Lu | 2014-11-18 |
| 8835323 | Method for integrated circuit patterning | Ming-Feng Shieh, Ru-Gun Liu, Tsai-Sheng Gau | 2014-09-16 |
| 8828885 | Photo resist trimmed line end space | Chia-Ying Lee, Jyu-Horng Shieh, Ming-Feng Shieh, Chih-Ming Lai, Ken-Hsien Hsieh +1 more | 2014-09-09 |
| 8806392 | Distinguishable IC patterns with encoded information | Tzu-Chin Lin, Jen-Chieh Lo, Yu-Po Tang, Tsong-Hua Ou | 2014-08-12 |
| 8779592 | Via-free interconnect structure with self-aligned metal line interconnections | Yu-Po Tang, Ken-Hsien Hsieh, Ru-Gun Liu | 2014-07-15 |
| 8758963 | Holographic reticle and patterning method | Chung-Hsing Chang, Wen-Chuan Wang, Chi-Lun Lu, Sheng-Chi Chin, Chin-Hsiang Lin +1 more | 2014-06-24 |
| 8716841 | Photolithography mask and process | Shuo-Yen Chou | 2014-05-06 |
| 8413606 | Feed carrier receptacle for use in rotary feed dispensing mechanism | Jin Cao | 2013-04-09 |
| 8378319 | System and method for generating direct-write pattern | Faruk Krecinic, Shy-Jay Lin, Jeng-Horng Chen, Tuane Ying Fang, Wei-Long Wang +1 more | 2013-02-19 |
| 8282850 | Apparatus and method for controlling relative particle concentrations in a plasma | Chi-Lun Lu | 2012-10-09 |
| 8227150 | Holographic reticle and patterning method | Chung-Hsing Chang, Wen-Chuan Wang, Chi-Lun Lu, Sheng-Chi Chin, Chin-Hsiang Lin +1 more | 2012-07-24 |
| 8178280 | Self-contained proximity effect correction inspiration for advanced lithography (special) | Shy-Jay Lin | 2012-05-15 |