Issued Patents All Time
Showing 26–50 of 168 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11854820 | Spacer etching process for integrated circuit design | Ru-Gun Liu, Cheng-Hsiung Tsai, Chung-Ju Lee, Chih-Ming Lai, Chia-Ying Lee +6 more | 2023-12-26 |
| 11854807 | Line-end extension method and device | Chih-Min HSIAO, Chien-Wen Lai, Ru-Gun Liu, Chih-Ming Lai, Yung-Sung Yen +1 more | 2023-12-26 |
| 11848208 | Method for forming semiconductor device structure | Chih-Ming Lai, Wei-Liang Lin, Chin-Yuan Tseng, Ru-Gun Liu | 2023-12-19 |
| 11789370 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Chih-Jie Lee, Shuo-Yen Chou, Ru-Gun Liu | 2023-10-17 |
| 11782352 | Lithography process monitoring method | Chih-Jie Lee, Shih-Chun Huang, Ken-Hsien Hsieh, Yung-Sung Yen, Ru-Gun Liu | 2023-10-10 |
| 11714951 | Geometric mask rule check with favorable and unfavorable zones | Shinn-Sheng Yu, Jue-Chin Yu, Ping-Chieh Wu | 2023-08-01 |
| 11687006 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Hsin-Chang Lee, Tran-Hui Shen, Yen-Cheng HO +1 more | 2023-06-27 |
| 11586115 | Method of operating semiconductor apparatus | Chiu-Hsiang Chen, Ru-Gun Liu | 2023-02-21 |
| 11572087 | Radar monitoring system for traffic control and method thereof | Yu-Jen Lin, Guo-Hao Syu | 2023-02-07 |
| 11556058 | Proximity effect correction in electron beam lithography | Wen Lo | 2023-01-17 |
| 11543753 | Tunable illuminator for lithography systems | Ken-Hsien Hsieh, Wen Lo, Wei-Shuo Su, Hua-Tai Lin | 2023-01-03 |
| 11526081 | Dummy insertion for improving throughput of electron beam lithography | Wen Lo, Chun-Hung Liu, Chia-Hua Chang, Hsin-Wei Wu, Ta-Wei Ou +2 more | 2022-12-13 |
| 11508661 | Integrated circuit and method of manufacturing same | Pochun Wang, Ting-Wei Chiang, Chih-Ming Lai, Hui-Zhong Zhuang, Jung-Chan Yang +6 more | 2022-11-22 |
| 11467509 | Lithography process monitoring method | Chih-Jie Lee, Shih-Chun Huang, Ken-Hsien Hsieh, Yung-Sung Yen, Ru-Gun Liu | 2022-10-11 |
| 11467488 | Semiconductor apparatus and method of operating the same | Wen Lo, Chun-Hung Liu | 2022-10-11 |
| 11437239 | Method for forming semiconductor device structure | Chih-Ming Lai, Wei-Liang Lin, Chin-Yuan Tseng, Ru-Gun Liu | 2022-09-06 |
| 11378894 | Lithography system with an embedded cleaning module | Shang-Chieh Chien, Jeng-Horng Chen, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh +3 more | 2022-07-05 |
| 11327405 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Hsin-Chang Lee, Tran-Hui Shen, Yen-Cheng HO +1 more | 2022-05-10 |
| 11307492 | Method for forming photomask and photolithography method | Minfeng Chen, Min-An Yang, Shao-Chi Wei | 2022-04-19 |
| 11294286 | Pattern formation method using a photo mask for manufacturing a semiconductor device | Ru-Gun Liu, Chin-Hsiang Lin, Cheng-I Huang, Chih-Ming Lai, Chien-Wen Lai +2 more | 2022-04-05 |
| 11289376 | Methods for forming self-aligned interconnect structures | Ru-Gun Liu, Hoi-Tou Ng | 2022-03-29 |
| 11243472 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Chih-Jie Lee, Shuo-Yen Chou, Ru-Gun Liu | 2022-02-08 |
| 11175597 | Pellicle structure for lithography mask | Chiu-Hsiang Chen, Ru-Gun Liu, Minfeng Chen | 2021-11-16 |
| 11145519 | Mechanisms for forming patterns using multiple lithography processes | — | 2021-10-12 |
| 11137691 | Fixing blank mask defects by revising layouts | Wei-Hsuan Liang | 2021-10-05 |