Issued Patents All Time
Showing 101–125 of 131 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10164067 | Method of fabricating a semiconductor device | Yi-Chen Lo, Yu-Lien Huang | 2018-12-25 |
| 10157773 | Semiconductor structure having layer with re-entrant profile and method of forming the same | Yi-Shan Chen, Chan Syun David Yang, Pinyen Lin | 2018-12-18 |
| 10157751 | Method for manufacturing semiconductor device | Jung-Hao Chang, Chao-Hsien Huang, Wen-Ting Lan, Shi Ning Ju, Kuo-Cheng Ching | 2018-12-18 |
| 10032887 | Method of forming a contact | Yu-Lien Huang, Yuan-Hung Chiu, Han-Yu Lin | 2018-07-24 |
| 9627258 | Method of forming a contact | Yu-Lien Huang, Yuan-Hung Chiu, Han-Yu Lin | 2017-04-18 |
| 9196491 | End-cut first approach for critical dimension control | Meng-Jun Wang, Ya Hui Chang, Hui Ouyang | 2015-11-24 |
| 8563410 | End-cut first approach for critical dimension control | Meng-Jun Wang, Ya Hui Chang, Hui Ouyang | 2013-10-22 |
| 8404546 | Source/drain carbon implant and RTA anneal, pre-SiGe deposition | Wei-Yen Woon, Chun-Feng Nieh, Ching-Yi Chen, Hsun Chang, Chung-Ru Yang | 2013-03-26 |
| 8212253 | Shallow junction formation and high dopant activation rate of MOS devices | Chun-Feng Nieh, Keh-Chiang Ku, Nai-Han Cheng, Chi-Chun Chen | 2012-07-03 |
| 8039375 | Shallow junction formation and high dopant activation rate of MOS devices | Chun-Feng Nieh, Keh-Chiang Ku, Nai-Han Cheng, Chi-Chun Chen | 2011-10-18 |
| 7838887 | Source/drain carbon implant and RTA anneal, pre-SiGe deposition | Wei-Yen Woon, Chun-Feng Nieh, Ching-Yi Chen, Hsun Chang, Chung-Ru Yang | 2010-11-23 |
| 7816217 | Multi-step epitaxial process for depositing Si/SiGe | Pang-Yen Tsai, Chih-Chien Chang, Tze-Liang Lee | 2010-10-19 |
| 7612389 | Embedded SiGe stressor with tensile strain for NMOS current enhancement | Chih-Chien Chang, Tze-Liang Lee | 2009-11-03 |
| 7494884 | SiGe selective growth without a hard mask | Hsien-Hsin Lin, Tze-Liang Lee, Ming-Hua Yu | 2009-02-24 |
| 7390753 | In-situ plasma treatment of advanced resists in fine pattern definition | Yui Wang, Huan-Just Lin, Yuan-Hung Chiu, Hun-Jan Tao | 2008-06-24 |
| 7307009 | Phosphoric acid free process for polysilicon gate definition | Fang Chen, Huin-Jer Lin, Yuan-Hung Chiu, Hun-Jan Tao | 2007-12-11 |
| 7253112 | Dual damascene process | Bang-Chien Ho, Jian-Hong Chen, Tsang-Jiuh Wu, Li-Chih Chao, Hua-Tai Lin +1 more | 2007-08-07 |
| 7179715 | Method for controlling spacer oxide loss | Ju-Chien Chiang, Shu-Huei Sun | 2007-02-20 |
| 7109085 | Etching process to avoid polysilicon notching | Shiang-Bau Wang, Ming-Ching Chang, Ryan Chia-Jen Chen, Yuan-Hung Chiu, Hun-Jan Tao | 2006-09-19 |
| 6864174 | Iteratively selective gas flow control and dynamic database to achieve CD uniformity | Yui Wang, Ming-Ching Chang, Li-Shung Chen, Huain-Jelin Lin, Yuan-Hong Chin +1 more | 2005-03-08 |
| 6849531 | Phosphoric acid free process for polysilicon gate definition | Fang-Chen Cheng, Huin-Jer Lin, Yuan-Hung Chiu, Hun-Jan Tao | 2005-02-01 |
| 6835578 | Test structure for differentiating the line and via contribution in stress migration | Chin-Chiu Hsia | 2004-12-28 |
| 6797630 | Partial via hard mask open on low-k dual damascene etch with dual hard mask (DHM) approach | Tsang-Jiuh Wu, Chen-Nan Yeh, Li-Chih Chao | 2004-09-28 |
| 6797627 | Dry-wet-dry solvent-free process after stop layer etch in dual damascene process | Hsin-Ching Shih, Yi-Nien Su, Li-Chie Chiao | 2004-09-28 |
| 6794302 | Dynamic feed forward temperature control to achieve CD etching uniformity | Li-Shiun Chen, Ming-Ching Chang, Huan-Just Lin, Yung-Hog Chiu, Hun-Jan Tao | 2004-09-21 |