Issued Patents All Time
Showing 76–100 of 153 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8179516 | Protective layer on objective lens for liquid immersion lithography applications | David Lu | 2012-05-15 |
| 8143602 | High-volume manufacturing massive e-beam maskless lithography system | Jeng-Horng Chen, Shy-Jay Lin | 2012-03-27 |
| 8125611 | Apparatus and method for immersion lithography | Ching-Yu Chang, Tsai-Sheng Gau | 2012-02-28 |
| 8110345 | High resolution lithography system and method | Chin-Hsiang Lin | 2012-02-07 |
| 8054444 | Lens cleaning module for immersion lithography apparatus | David Lu | 2011-11-08 |
| 7999910 | System and method for manufacturing a mask for semiconductor processing | Chia-Jen Chen, Hsin-Chang Lee, Sheng-Chi Chin, Hung-Chang Hsieh | 2011-08-16 |
| 7986395 | Immersion lithography apparatus and methods | Ching-Yu Chang, Chin-Hsiang Lin | 2011-07-26 |
| RE42556 | Apparatus for method for immersion lithography | — | 2011-07-19 |
| 7972761 | Photoresist materials and photolithography process | Hsien-Cheng Wang, Chin-Hsiang Lin, H. J. Lee, Ching-Yu Chang, Hua-Tai Lin | 2011-07-05 |
| 7934177 | Method and system for a pattern layout split | Jaw-Jung Shin, King-Chang Shu, Tsai-Sheng Gau | 2011-04-26 |
| 7924397 | Anti-corrosion layer on objective lens for liquid immersion lithography applications | David Lu | 2011-04-12 |
| 7924401 | Seal ring arrangements for immersion lithography systems | Tsai-Sheng Gau, Chun-Kuang Chen, Ru-Gun Liu, Shinn-Sheng Yu, Jen-Chieh Shih | 2011-04-12 |
| 7851774 | System and method for direct writing to a wafer | Jeng-Horng Chen, Shy-Jay Lin, Tsai-Sheng Gau | 2010-12-14 |
| 7829248 | Pellicle stress relief | Hsin-Chang Lee, Ming-Jiun Yao | 2010-11-09 |
| 7767984 | Resist collapse prevention using immersed hardening | Ching-Yu Chang | 2010-08-03 |
| 7700267 | Immersion fluid for immersion lithography, and method of performing immersion lithography | Yee-Chia Yeo, Chenming Hu | 2010-04-20 |
| 7667821 | Multi-focus scanning with a tilted mask or wafer | Chun-Kuang Chen, Tsai-Sheng Gau, Chia-Hui Lin, Ru-Gun Liu, Jen-Chieh Shih | 2010-02-23 |
| 7666576 | Exposure scan and step direction optimization | Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen, Tsai-Sheng Gau | 2010-02-23 |
| 7659964 | Level adjustment systems and adjustable pin chuck thereof | Tsai-Sheng Gau, Jeng-Horng Chen | 2010-02-09 |
| 7517639 | Seal ring arrangements for immersion lithography systems | Tsai-Sheng Gau, Chun-Kuang Chen, Ru-Gun Liu, Shinn-Sheng Yu, Jen-Chieh Shih | 2009-04-14 |
| 7501226 | Immersion lithography system with wafer sealing mechanisms | Tsai-Sheng Gau, Chun-Kung Chen, Ru-Gun Liu, Shing Shen Yu, Jen-Chieh Shih | 2009-03-10 |
| 7482280 | Method for forming a lithography pattern | Ching-Yu Chang, Chin-Hsiang Lin | 2009-01-27 |
| 7479466 | Method of heating semiconductor wafer to improve wafer flatness | Hsiao-Tzu Lu, Chin-Hsiang Lin, Kuei-Shun Chen, Tsai-Sheng Gau | 2009-01-20 |
| 7473517 | Supercritical developing for a lithographic process | Ching-Yu Chang, Chi-Wen Liu | 2009-01-06 |
| 7420188 | Exposure method and apparatus for immersion lithography | Ching-Yu Chang, Chin-Hsiang Lin, David Lu | 2008-09-02 |