Issued Patents All Time
Showing 26–50 of 153 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9436787 | Method of fabricating an integrated circuit with optimized pattern density uniformity | Jyuh-Fuh Lin, Pei-Yi Liu, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin | 2016-09-06 |
| 9436788 | Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity | Jyuh-Fuh Lin, Pei-Yi Liu, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin | 2016-09-06 |
| 9390891 | Apparatus for charged particle lithography system | Shih-Chi Wang, Tsung-Chih Chien, Hui-Min Huang, Jaw-Jung Shin, Shy-Jay Lin | 2016-07-12 |
| 9330933 | Method and apparatus for planarizing a polymer layer | — | 2016-05-03 |
| 9329488 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Jaw-Jung Shin | 2016-05-03 |
| 9291913 | Pattern generator for a lithography system | Chen-Hua Yu, Tien-I Bao, Chih Wei Lu, Jaw-Jung Shin, Shy-Jay Lin | 2016-03-22 |
| 9287125 | Multiple edge enabled patterning | Ming-Feng Shieh, Ya Hui Chang, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh | 2016-03-15 |
| 9229332 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Shy-Jay Lin, Jaw-Jung Shin, Wen-Chuan Wang | 2016-01-05 |
| 9182660 | Methods for electron beam patterning | Wen-Chuan Wang, Shy-Jay Lin, Jaw-Jung Shin | 2015-11-10 |
| 9176389 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Jaw-Jung Shin | 2015-11-03 |
| 9147377 | Method for image dithering for lithographic processes | Cheng-Hung Chen, Shy-Jay Shin, Jaw-Jung Shin | 2015-09-29 |
| 9134627 | Multiple-patterning overlay decoupling method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Jaw-Jung Shin | 2015-09-15 |
| 9046789 | Immersion lithography system using a sealed wafer bath | Ching-Yu Chang | 2015-06-02 |
| 9003336 | Mask assignment optimization | Wen-Chun Huang, Ken-Hsien Hsieh, Ming-Hui Chih, Chih-Ming Lai, Ru-Gun Liu +4 more | 2015-04-07 |
| 9001308 | Pattern generator for a lithography system | Chen-Hua Yu, Tien-I Bao, Chih Wei Lu, Jaw-Jung Shin, Shy-Jay Lin | 2015-04-07 |
| 8987689 | Efficient scan for E-beam lithography | Cheng-Hung Chen, Shih-Chi Wang, Jeng-Horng Chen | 2015-03-24 |
| 8984452 | Long-range lithographic dose correction | Cheng-Hung Chen, Shy-Jay Lin, Jaw-Jung Shin, Wen-Chuan Wang, Pei-Yi Liu | 2015-03-17 |
| 8972908 | Method for electron beam proximity correction with improved critical dimension accuracy | Cheng-Hung Chen, Jaw-Jung Shin, Shy-Jay Lin, Wen-Chuan Wang, Pei-Yi Liu | 2015-03-03 |
| 8956806 | Photoresist and patterning process | Chien-Wei Wang, Ching-Yu Chang | 2015-02-17 |
| 8927947 | Systems and methods providing electron beam writing to a medium | Wen-Chuan Wang, Shy-Jay Lin, Jaw-Jung Shin | 2015-01-06 |
| 8906583 | Stacked mask | Hsin-Chang Lee, Sheng-Chi Chin | 2014-12-09 |
| 8852849 | Electron beam lithography system and method for improving throughput | Jaw-Jung Shin, Shy-Jay Lin, Wen-Chuan Wang | 2014-10-07 |
| 8846278 | Electron beam lithography system and method for improving throughput | Jaw-Jung Shin, Shy-Jay Lin, Wen-Chuan Wang | 2014-09-30 |
| 8848163 | Photoresist materials and photolithography processes | Hsien-Cheng Wang, Chin-Hsiang Lin, Heng-Jen Lee, Ching-Yu Chang, Hua-Tai Lin | 2014-09-30 |
| 8828632 | Multiple-grid exposure method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Jaw-Jung Shin | 2014-09-09 |