Issued Patents All Time
Showing 51–75 of 153 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8822107 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Jaw-Jung Shin | 2014-09-02 |
| 8822106 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Jaw-Jung Shin | 2014-09-02 |
| 8767178 | Immersion lithography system using direction-controlling fluid inlets | Ching-Yu Chang | 2014-07-01 |
| 8762900 | Method for proximity correction | Jaw-Jung Shin, Shy-Jay Lin, Hua-Tai Lin | 2014-06-24 |
| 8762899 | Method for metal correlated via split for double patterning | Tsai-Sheng Gau, Ru-Gun Liu, Wen-Chun Huang | 2014-06-24 |
| 8730473 | Multiple edge enabled patterning | Ming-Feng Shieh, Ya Hui Chang, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh | 2014-05-20 |
| 8722286 | Devices and methods for improved reflective electron beam lithography | Chen-Hua Yu, Jaw-Jung Shin, Shy-Jay Lin | 2014-05-13 |
| 8693115 | Apparatus for method for immersion lithography | — | 2014-04-08 |
| 8688254 | Multiple tools using a single data processing unit | — | 2014-04-01 |
| 8658344 | Patterning process and photoresist with a photodegradable base | Chien-Wei Wang, Ching-Yu Chang, Tsai-Sheng Gau | 2014-02-25 |
| 8659843 | Apparatus for method for immersion lithography | — | 2014-02-25 |
| 8610083 | Systems and methods providing electron beam writing to a medium | Wen-Chuan Wang, Shy-Jay Lin, Jaw-Jung Shin | 2013-12-17 |
| 8584057 | Non-directional dithering methods | Pei-Yi Liu, Shy-Jay Lin, Wen-Chuan Wang, Jaw-Jung Shin | 2013-11-12 |
| 8564759 | Apparatus and method for immersion lithography | Ching-Yu Chang | 2013-10-22 |
| 8563198 | Device and method for providing wavelength reduction with a photomask | Jeng-Horng Chen, Chun-Kuang Chen, Tsai-Sheng Gau, Ru-Gun Liu, Jen-Chieh Shih | 2013-10-22 |
| 8530121 | Multiple-grid exposure method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Jaw-Jung Shin | 2013-09-10 |
| 8524427 | Electron beam lithography system and method for improving throughput | Jaw-Jung Shin, Shy-Jay Lin, Wen-Chuan Wang | 2013-09-03 |
| 8510687 | Error diffusion and grid shift in lithography | Pei-Yi Liu, Shy-Jay Lin, Wen-Chuan Wang, Jaw-Jung Shin | 2013-08-13 |
| 8507177 | Photoresist materials and photolithography processes | Hsien-Cheng Wang, Chin-Hsiang Lin, Heng-Jen Lee, Ching-Yu Chang, Hua-Tai Lin | 2013-08-13 |
| 8488102 | Immersion fluid for immersion lithography, and method of performing immersion lithography | Yee-Chia Yeo, Chenming Hu | 2013-07-16 |
| 8381139 | Method for metal correlated via split for double patterning | Tsai-Sheng Gau, Ru-Gun Liu, Wen-Chun Huang | 2013-02-19 |
| 8368037 | Systems and methods providing electron beam writing to a medium | Wen-Chuan Wang, Shy-Jay Lin, Jaw-Jung Shin | 2013-02-05 |
| 8216767 | Patterning process and chemical amplified photoresist with a photodegradable base | Chien-Wei Wang, Ching-Yu Chang, Tsai-Sheng Gau | 2012-07-10 |
| 8208116 | Immersion lithography system using a sealed wafer bath | Ching-Yu Chang | 2012-06-26 |
| 8180141 | Wafer repair system | Chin-Hsiang Lin, Tsai-Shen Gau | 2012-05-15 |