Issued Patents All Time
Showing 126–150 of 153 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6897455 | Apparatus and method for repairing resist latent images | — | 2005-05-24 |
| 6877152 | Method of inter-field critical dimension control | Tsai-Sheng Gau, Anthony Yen | 2005-04-05 |
| 6788477 | Apparatus for method for immersion lithography | — | 2004-09-07 |
| 6777143 | Multiple mask step and scan aligner | — | 2004-08-17 |
| 6711732 | Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era | Chang-Ming Dai, Chung-Hsing Chang, Jan-Wen You | 2004-03-23 |
| 6664011 | Hole printing by packing and unpacking using alternating phase-shifting masks | Shinn-Sheng Yu, Bang-Chein Ho | 2003-12-16 |
| 6627358 | Mask repair in resist image | — | 2003-09-30 |
| 6492073 | Removal of line end shortening in microlithography and mask set for removal | Ru-Gun Liu, Shih-Ying Chen, Shinn-Sheng Yu, Hua-Tai Lin, Anthony Yen +1 more | 2002-12-10 |
| 6492077 | Multiple-reticle mask holder and aligner | — | 2002-12-10 |
| 5795685 | Simple repair method for phase shifting masks | Lars Liebmann, Mark Neisser | 1998-08-18 |
| 5715064 | Step and repeat apparatus having enhanced accuracy and increased throughput | — | 1998-02-03 |
| 5571560 | Proximity-dispensing high-throughput low-consumption resist coating device | — | 1996-11-05 |
| 5565286 | Combined attenuated-alternating phase shifting mask structure and fabrication methods therefor | — | 1996-10-15 |
| 5523186 | Split and cover technique for phase shifting photolithography | Donald J. Samuels | 1996-06-04 |
| 5472814 | Orthogonally separated phase shifted and unphase shifted mask patterns for image improvement | — | 1995-12-05 |
| 5449405 | Material-saving resist spinner and process | Thomas J. Cardinali | 1995-09-12 |
| 5446540 | Method of inspecting phase shift masks employing phase-error enhancing | — | 1995-08-29 |
| 5403682 | Alternating rim phase-shifting mask | — | 1995-04-04 |
| 5378511 | Material-saving resist spinner and process | Thomas J. Cardinali | 1995-01-03 |
| 5366757 | In situ resist control during spray and spin in vapor | — | 1994-11-22 |
| 5288569 | Feature biassing and absorptive phase-shifting techniques to improve optical projection imaging | — | 1994-02-22 |
| 5272024 | Mask-structure and process to repair missing or unwanted phase-shifting elements | — | 1993-12-21 |
| 4902899 | Lithographic process having improved image quality | Anne M. Moruzzi, Alan E. Rosenbluth | 1990-02-20 |
| 4737425 | Patterned resist and process | Bea-Jane L. Yang, Jer-Mind Yang | 1988-04-12 |
| 4585342 | System for real-time monitoring the characteristics, variations and alignment errors of lithography structures | Yuan Taur | 1986-04-29 |