BL

Burn Jeng Lin

TSMC: 132 patents #155 of 12,232Top 2%
IBM: 18 patents #6,125 of 70,183Top 9%
NU National Tsing Hua University: 6 patents #72 of 2,036Top 4%
📍 Hsinchu, NY: #4 of 65 inventorsTop 7%
Overall (All Time): #5,928 of 4,157,543Top 1%
153
Patents All Time

Issued Patents All Time

Showing 151–153 of 153 patents

Patent #TitleCo-InventorsDate
4543319 Polystyrene-tetrathiafulvalene polymers as deep-ultraviolet mask material Vivian W. Chao, Frank B. Kaufman, Steven R. Kramer 1985-09-24
4456371 Optical projection printing threshold leveling arrangement 1984-06-26
4211834 Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask Constantino Lapadula 1980-07-08