Issued Patents All Time
Showing 351–375 of 563 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8507175 | Patterning process and resist composition | Masaki Ohashi, Youichi Ohsawa, Kazuhiro Katayama | 2013-08-13 |
| 8501384 | Positive resist composition and patterning process | Takeru Watanabe, Seiichiro Tachibana | 2013-08-06 |
| 8492078 | Patterning process | Takeshi Nagata, Koji Hasegawa | 2013-07-23 |
| 8450048 | Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film | Toshihiko Fujii, Tsutomu Ogihara | 2013-05-28 |
| 8450042 | Positive resist composition and patterning process | Koji Hasegawa, Seiichiro Tachibana | 2013-05-28 |
| 8440386 | Patterning process, resist composition, and acetal compound | Takeshi Nagata, Koji Hasegawa | 2013-05-14 |
| 8431323 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Yuji Harada +2 more | 2013-04-30 |
| 8426105 | Resist-modifying composition and pattern forming process | Takeru Watanabe, Masashi Iio, Kazuhiro Katayama, Tsunehiro Nishi, Takeshi Kinsho | 2013-04-23 |
| 8426115 | Patterning process and resist composition | Kazuhiro Katayama, Youichi Ohsawa, Masaki Ohashi | 2013-04-23 |
| 8426110 | Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound | Takeru Watanabe, Tomohiro Kobayashi, Katsuya Takemura | 2013-04-23 |
| 8367310 | Pattern forming process and resist-modifying composition | Takeru Watanabe, Masashi Iio, Tsunehiro Nishi, Yoshio Kawai | 2013-02-05 |
| 8361703 | Resist protective coating composition and patterning process | Yuji Harada, Koji Hasegawa | 2013-01-29 |
| 8349533 | Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process | Youichi Ohsawa, Takeru Watanabe, Takeshi Kinsho | 2013-01-08 |
| 8338078 | Photoresist undercoat-forming material and patterning process | Toshihiko Fujii, Takeru Watanabe, Youichi Ohsawa | 2012-12-25 |
| 8329384 | Resist-modifying composition and pattern forming process | Takeru Watanabe, Kazuhiro Katayama, Masashi Iio, Tsunehiro Nishi, Takeshi Kinsho | 2012-12-11 |
| 8323872 | Resist protective coating material and patterning process | Takeru Watanabe, Yuji Harada | 2012-12-04 |
| 8313886 | Resist composition and patterning process | Yuji Harada, Koji Hasegawa, Tomohiro Kobatashi | 2012-11-20 |
| 8313890 | Antireflective coating composition, antireflective coating, and patterning process | Seiichiro Tachibana, Kazumi Noda, Takeru Watanabe, Takeshi Kinsho | 2012-11-20 |
| 8288072 | Resist lower layer film-formed substrate | Kazumi Noda, Seiichiro Tachibana, Takeshi Kinsho, Tsutomu Ogihara | 2012-10-16 |
| 8268528 | Resist composition and patterning process | Yuji Harada, Koji Hasegawa, Kazunori Maeda, Tomohiro Kobayashi | 2012-09-18 |
| 8252504 | Polymer, resist composition, and patterning process | Yuji Harada, Kazunori Maeda, Tomohiro Kobayashi | 2012-08-28 |
| 8247166 | Double patterning process | Katsuya Takemura, Tsunehiro Nishi, Masaki Ohashi, Takeshi Kinsho | 2012-08-21 |
| 8216774 | Patterning process | — | 2012-07-10 |
| 8211618 | Positive resist composition and patterning process | Koji Hasegawa, Seiichiro Tachibana | 2012-07-03 |
| 8198016 | Patterning process | Tsutomu Ogihara, Mutsuo Nakashima, Kazuhiro Katayama | 2012-06-12 |