Issued Patents All Time
Showing 326–350 of 563 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8828641 | Chemically amplified resist composition and patterning process | Takeru Watanabe | 2014-09-09 |
| 8828647 | Patterning process and resist composition | Tomohiro Kobayashi | 2014-09-09 |
| 8822136 | Patterning process and resist composition | Kazuhiro Katayama, Youichi Ohsawa | 2014-09-02 |
| 8815492 | Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process | Youichi Ohsawa, Masaki Ohashi, Takeshi Sasami | 2014-08-26 |
| 8808966 | Positive resist composition and patterning process | Koji Hasegawa | 2014-08-19 |
| 8791290 | Acetal compound, polymer, resist composition, and patterning process | Koji Hasegawa, Takeshi Nagata, Seiichiro Tachibana, Takeshi Kinsho | 2014-07-29 |
| 8790866 | Patterning process and resist composition | Kazuhiro Katayama, Tomohiro Kobayashi | 2014-07-29 |
| 8785105 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Youichi Ohsawa, Masaki Ohashi, Seiichiro Tachibana | 2014-07-22 |
| 8778592 | Positive resist composition and patterning process | Takeshi Nagata, Taku Morisawa | 2014-07-15 |
| 8753805 | Patterning process and resist composition | Tomohiro Kobayashi, Koji Hasegawa | 2014-06-17 |
| 8741554 | Patterning process and resist composition | Kazuhiro Katayama, Youichi Ohsawa, Masaki Ohashi | 2014-06-03 |
| 8741546 | Patterning process and resist composition | Kazuhiro Katayama, Youichi Ohsawa, Masaki Ohashi | 2014-06-03 |
| 8741548 | Patterning process | Takao Yoshihara, Katsuya Takemura, Yoshio Kawai | 2014-06-03 |
| 8735046 | Positive resist composition and patterning process | Koji Hasegawa | 2014-05-27 |
| 8703404 | Patterning process | Masashi Iio | 2014-04-22 |
| 8703408 | Patterning process | Kazuhiro Katayama, Koji Hasegawa | 2014-04-22 |
| 8691494 | Patterning process | Tomohiro Kobayashi, Takeshi Nagata | 2014-04-08 |
| 8652757 | Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film | Toshihiko Fujii, Tsutomu Ogihara | 2014-02-18 |
| 8652756 | Positive resist composition and patterning process | Daisuke KORI | 2014-02-18 |
| 8632939 | Polymer, chemically amplified positive resist composition and pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Youichi Ohsawa, Daisuke Domon | 2014-01-21 |
| 8623590 | Pattern forming process | Kenji Funatsu | 2014-01-07 |
| 8617800 | Patterning process | Kazuhiro Katayama, Yoshio Kawai | 2013-12-31 |
| 8574816 | Positive resist composition and patterning process | Daisuke KORI | 2013-11-05 |
| 8574817 | Positive resist composition and patterning process | Koji Hasegawa | 2013-11-05 |
| 8507173 | Patterning process | Kazuhiro Katayama | 2013-08-13 |