Issued Patents All Time
Showing 276–300 of 563 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9162967 | Sulfonium salt, polymer, resist composition, and patterning process | Masaki Ohashi | 2015-10-20 |
| 9152050 | Resist composition and patterning process | — | 2015-10-06 |
| 9146464 | Sulfonium salt, polymer, polymer making method, resist composition, and patterning process | Masaki Ohashi, Teppei Adachi, Masahiro Fukushima | 2015-09-29 |
| 9146468 | Resist underlayer film composition and patterning process using the same | Daisuke KORI, Tsutomu Ogihara | 2015-09-29 |
| 9140988 | Positive resist composition, monomer, polymer, and patterning process | Koji Hasegawa, Masaki Ohashi | 2015-09-22 |
| 9136122 | Underlayer film-forming composition and pattern forming process | Daisuke KORI, Tsutomu Ogihara | 2015-09-15 |
| 9136121 | Underlayer film-forming composition and pattern forming process | Daisuke KORI, Tsutomu Ogihara | 2015-09-15 |
| 9122147 | Pattern forming process | Tsutomu Ogihara | 2015-09-01 |
| 9122152 | Patterning process and resist composition | Tomohiro Kobayashi, Kenji Funatsu | 2015-09-01 |
| 9104105 | Patterning process and resist composition | Tomohiro Kobayashi, Koji Hasegawa | 2015-08-11 |
| 9104110 | Polymer, resist composition and patterning process | Masaki Ohashi | 2015-08-11 |
| 9091933 | Negative pattern forming process | Tomohiro Kobayashi, Kazuhiro Katayama, Kenji Funatsu, Seiichiro Tachibana | 2015-07-28 |
| 9091914 | Resist composition and patterning process | — | 2015-07-28 |
| 9091918 | Sulfonium salt, polymer, resist composition, and patterning process | Masahiro Fukushima, Masaki Ohashi, Teppei Adachi | 2015-07-28 |
| 9086625 | Resist composition and patterning process | Kazuhiro Katayama, Kenji Funatsu | 2015-07-21 |
| 9086624 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa | 2015-07-21 |
| 9081290 | Patterning process and resist composition | Koji Hasegawa, Masayoshi Sagehashi, Kazuhiro Katayama, Kentaro Kumaki, Tomohiro Kobayashi | 2015-07-14 |
| 9075308 | Positive resist composition and patterning process | Koji Hasegawa | 2015-07-07 |
| 9063413 | Resist composition, patterning process, monomer, and copolymer | Masayoshi Sagehashi | 2015-06-23 |
| 9057959 | Developer for photosensitive resist material and patterning process | Masaki Ohashi | 2015-06-16 |
| 9057949 | Patterning process, resist composition, polymer, and polymerizable ester compound | Takeru Watanabe, Tomohiro Kobayashi, Kazuhiro Katayama, Takeshi Kinsho | 2015-06-16 |
| 9052603 | Pattern forming process | Tsutomu Ogihara, Yusuke Biyajima | 2015-06-09 |
| 9052602 | Developer for photosensitive resist material and patterning process | Masaki Ohashi | 2015-06-09 |
| 9052593 | Resist composition and patterning process | Masayoshi Sagehashi | 2015-06-09 |
| 9040223 | Resist composition, patterning process and polymer | Koji Hasegawa, Kenji Funatsu | 2015-05-26 |