Issued Patents All Time
Showing 251–275 of 563 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9429843 | Positive resist composition and patterning process | Koji Hasegawa | 2016-08-30 |
| 9411226 | Chemically amplified resist composition and patterning process | — | 2016-08-09 |
| 9366963 | Resist composition and pattern forming process | Masayoshi Sagehashi | 2016-06-14 |
| 9360760 | Pattern forming process and shrink agent | Teppei Adachi | 2016-06-07 |
| 9360753 | Resist composition and patterning process | — | 2016-06-07 |
| 9335633 | Positive resist composition and patterning process | Koji Hasegawa, Masayoshi Sagehashi | 2016-05-10 |
| 9335632 | Positive resist composition and patterning process | Koji Hasegawa | 2016-05-10 |
| 9316915 | Negative resist composition and pattern forming process | Masayoshi Sagehashi | 2016-04-19 |
| 9316909 | Patterning process | — | 2016-04-19 |
| 9315670 | Composition for forming resist underlayer film and patterning process | Tsutomu Ogihara | 2016-04-19 |
| 9310683 | Monomer, polymer, positive resist composition and patterning process | Koji Hasegawa | 2016-04-12 |
| 9310681 | Negative resist composition and patterning process using same | Hiroyuki Urano, Masashi Iio | 2016-04-12 |
| 9274428 | Resist top coat composition and patterning process | Hyun-Woo Kim | 2016-03-01 |
| 9274425 | Resist composition and patterning process | Kazuhiro Katayama, Seiichiro Tachibana | 2016-03-01 |
| 9250517 | Polymer, positive resist composition and patterning process | Masayoshi Sagehashi, Koji Hasegawa | 2016-02-02 |
| 9250523 | Resist composition and patterning process | Kenji Funatsu, Kazuhiro Katayama | 2016-02-02 |
| 9250522 | Positive resist composition and patterning process | Koji Hasegawa, Masayoshi Sagehashi | 2016-02-02 |
| 9250518 | Resist composition and patterning process | Masaki Ohashi, Masayoshi Sagehashi | 2016-02-02 |
| 9244350 | Positive resist composition and patterning process | Masayoshi Sagehashi | 2016-01-26 |
| 9233919 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Youichi Ohsawa, Masaki Ohashi, Seiichiro Tachibana | 2016-01-12 |
| 9207534 | Nitrogen-containing monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Takeru Watanabe, Tomohiro Kobayashi | 2015-12-08 |
| 9201300 | Resist composition and patterning process | — | 2015-12-01 |
| 9201304 | Pattern forming process | Tsutomu Ogihara | 2015-12-01 |
| 9162967 | Sulfonium salt, polymer, resist composition, and patterning process | Masaki Ohashi | 2015-10-20 |
| 9164383 | Resist composition and patterning process | — | 2015-10-20 |