Issued Patents All Time
Showing 301–325 of 563 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9040222 | Polymerizable tertiary ester compound, polymer, resist composition, and patterning process | Yuki Suka, Koji Hasegawa | 2015-05-26 |
| 9029075 | Resist-protective film-forming composition and patterning process | — | 2015-05-12 |
| 9029064 | Patterning process and resist composition | Masayoshi Sagehashi, Takeru Watanabe, Kazuhiro Katayama | 2015-05-12 |
| 9023587 | Negative resist composition and patterning process | Koji Hasegawa, Daisuke Domon | 2015-05-05 |
| 9023586 | Positive resist composition and patterning process using same | — | 2015-05-05 |
| 9017923 | Negative resist composition and patterning process using the same | — | 2015-04-28 |
| 9017918 | Monomer, polymer, chemically amplified positive resist composition, and patterning process | Seiichiro Tachibana, Koji Hasegawa | 2015-04-28 |
| 9017922 | Chemically amplified resist composition and patterning process | Masayoshi Sagehashi | 2015-04-28 |
| 9017931 | Patterning process and resist composition | Koji Hasegawa, Masayoshi Sagehashi, Teppei Adachi | 2015-04-28 |
| 8999630 | Patterning process and resist composition | Koji Hasegawa, Kazuhiro Katayama | 2015-04-07 |
| 8992790 | Patterning process | Tsutomu Ogihara | 2015-03-31 |
| 8993222 | Pattern forming process | Kazuhiro Katayama | 2015-03-31 |
| 8980527 | Pattern forming process and resist compostion | Masaki Ohashi | 2015-03-17 |
| 8951712 | Resist protective film-forming composition and patterning process | — | 2015-02-10 |
| 8933251 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Yuji Harada +2 more | 2015-01-13 |
| 8932803 | Pattern forming process | Kazuhiro Katayama | 2015-01-13 |
| 8921026 | Basic compound, chemically amplified resist composition, and patterning process | Masayoshi Sagehashi, Takeru Watanabe | 2014-12-30 |
| 8911929 | Developer and patterning process | — | 2014-12-16 |
| 8895231 | Patterning process and resist composition | Kazuhiro Katayama | 2014-11-25 |
| 8883379 | Resist-protective film-forming composition and patterning process | Daisuke KORI | 2014-11-11 |
| 8877424 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama | 2014-11-04 |
| 8865390 | Patterning process and resist composition | Kazuhiro Katayama, Koji Hasegawa | 2014-10-21 |
| 8859181 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe, Youichi Ohsawa, Daisuke Domon | 2014-10-14 |
| 8846303 | Resist top coat composition and patterning process | Daisuke KORI | 2014-09-30 |
| 8841061 | Positive resist composition and patterning process | Koji Hasegawa | 2014-09-23 |