JH

Jun Hatakeyama

SC Shin-Etsu Chemical Co.: 550 patents #1 of 2,176Top 1%
CL Central Glass Company, Limited: 29 patents #11 of 968Top 2%
Sumitomo Electric Industries: 25 patents #692 of 21,551Top 4%
CK Calsonic Kansei: 5 patents #47 of 675Top 7%
PA Panasonic: 3 patents #7,617 of 21,108Top 40%
Samsung: 3 patents #30,683 of 75,807Top 45%
TP Tigers Polymer: 2 patents #17 of 76Top 25%
MJ Marelli Cabin Comfort Japan: 2 patents #11 of 36Top 35%
Honda Motor Co.: 1 patents #12,035 of 21,052Top 60%
SC Shin-Etsu Handotai Co.: 1 patents #385 of 679Top 60%
MC Mastsushita Electric Industrial Co.: 1 patents #1 of 26Top 4%
📍 Joetsu, JP: #1 of 239 inventorsTop 1%
Overall (All Time): #297 of 4,157,543Top 1%
563
Patents All Time

Issued Patents All Time

Showing 201–225 of 563 patents

Patent #TitleCo-InventorsDate
9897916 Compound, polymer compound, resist composition, and patterning process Masaki Ohashi, Masahiro Fukushima, Takayuki Fujiwara 2018-02-20
9899218 Resist under layer film composition and patterning process Takeru Watanabe, Daisuke KORI 2018-02-20
9897917 Conductive polymer composition, coated article, and patterning process Takayuki Nagasawa 2018-02-20
9897914 Resist composition and patterning process Masaki Ohashi 2018-02-20
9869931 Resist composition and patterning process 2018-01-16
9857686 Composition for forming resist underlayer film and patterning process Tsutomu Ogihara, Daisuke KORI, Naoki Kobayashi 2018-01-02
9846360 Resist composition and patterning process Teppei Adachi 2017-12-19
9829792 Monomer, polymer, positive resist composition, and patterning process Koji Hasegawa, Teppei Adachi 2017-11-28
9817314 Conductive polymer composition, coated article, patterning process, and substrate Takayuki Nagasawa 2017-11-14
9810983 Polymer, chemically amplified positive resist composition and patterning process Koji Hasegawa, Masayoshi Sagehashi 2017-11-07
9804492 Method for forming multi-layer film and patterning process Tsutomu Ogihara 2017-10-31
9798242 Rinse solution for pattern formation and pattern forming process Daisuke KORI, Tsutomu Ogihara 2017-10-24
9790166 Polymer, monomer, resist composition, and patterning process Masayoshi Sagehashi, Koji Hasegawa, Masahiro Fukushima, Kazuhiro Katayama 2017-10-17
9788422 Conductive material and substrate Takayuki Nagasawa 2017-10-10
9785049 Method for forming multi-layer film and patterning process Daisuke KORI 2017-10-10
9778570 Conductive polymer composition, coated article, patterning process and substrate Takayuki Nagasawa 2017-10-03
9777093 Polymer compound for a conductive polymer and method for producing same Takayuki Fujiwara, Takayuki Nagasawa, Koji Hasegawa 2017-10-03
9760010 Patterning process Teppei Adachi 2017-09-12
9758609 Monomer, polymer, resist composition, and patterning process Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama 2017-09-12
9752045 Conductive polymer composite and substrate Takayuki Nagasawa, Koji Hasegawa 2017-09-05
9720324 Resist composition and pattern forming process Koji Hasegawa 2017-08-01
9709890 Resist composition and patterning process Masayoshi Sagehashi, Daisuke Domon, Koji Hasegawa 2017-07-18
9666327 Conductive polymer material and substrate Takayuki Nagasawa 2017-05-30
9665002 Onium salt compound, resist composition, and pattern forming process Masahiro Fukushima, Masaki Ohashi 2017-05-30
9663656 Conductive polymer material and substrate Takayuki Nagasawa 2017-05-30